SCHEMBL2984356

SCHEMBL2984356

C[CH]CN(C)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11685991 0.79 SIGMAR1 (0.30)
SCHEMBL22157502 0.78
SCHEMBL16234553 0.78
SCHEMBL11501693 0.77
SCHEMBL9969645 0.76 SQLE (0.31)
SCHEMBL2990292 0.75
SCHEMBL1462570 0.74
SCHEMBL10020952 0.74
SCHEMBL4910774 0.74
SCHEMBL4910766 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9612544-B2 Electrostatic image developing toner MITSUBISHI CHEMICAL CORPORATION (JP) 2017-04-04 US disclosed
US-20160274476-A1 SLURRY CLEANING APPARATUS AND CLEANING SYSTEM MITSUBISHI CHEMICAL CORPORATION (JP) 2016-09-22 US disclosed
US-20160179025-A1 ELECTROSTATIC IMAGE DEVELOPING TONER MITSUBISHI CHEMICAL CORPORATION (JP) 2016-06-23 US disclosed
US-8394565-B2 Positively charged developer for development of electrostatic image and production process thereof ZEON CORPORATION (JP) 2013-03-12 US disclosed
US-20100173240-A1 POSITIVELY CHARGED DEVELOPER FOR DEVELOPMENT OF ELECTROSTATIC IMAGE AND PRODUCTION PROCESS THEREOF ZEON CORPORATION (JP) 2010-07-08 US disclosed