⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL1330452 | 0.89 | — | — | |
| Dimethylamine SCHEMBL12415750 | 0.89 | — | — | |
| Dimethylamine SCHEMBL5164633 | 0.89 | — | — | |
| Dimethylamine SCHEMBL392668 | 0.89 | — | — | |
| Dimethylamine SCHEMBL1030 | 0.89 | — | — | |
| Dimethylamine SCHEMBL13695986 | 0.89 | — | — | |
| Dimethylamine SCHEMBL733 | 0.80 | — | — | |
| Dimethylamine SCHEMBL1003093 | 0.80 | KDM4E (0.38) | — | |
| Dimethylamine SCHEMBL7601721 | 0.80 | — | — | |
| Dimethylamine SCHEMBL11567323 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117551119-A | Preparation method of novel dimer compound containing boron-nitrogen polar bond | 电子科技大学长三角研究院(湖州) | 2024-02-13 | — | — | CN | claimed |
| CN-224100691-U | Purification device of high-purity tetra (dimethylamino) titanium | 苏州凛泓材料科技有限公司 | 2026-04-10 | — | — | CN | disclosed |
| US-12473647-B2 | Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same | DNF CO., LTD. (KR) | 2025-11-18 | — | — | US | disclosed |
| US-20250289834-A1 | SILICON COMPOUND AND METHOD OF PRODUCING SILICON-CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2025-09-18 | — | — | US | disclosed |
| CN-120463737-A | Purification process of high-purity tetra (dimethylamino) titanium | 苏州凛泓材料科技有限公司 | 2025-08-12 | — | — | CN | disclosed |
| US-12195488-B2 | Organometallic compounds and thin film using same | MERCK PATENT GMBH (DE) | 2025-01-14 | — | — | US | disclosed |
| WO-2025005625-A1 | COMPOSITION FOR DEPOSITING ANTIMONY-CONTAINING THIN FILM, AND METHOD FOR MANUFACTURING ANTIMONY-CONTAINING THIN FILM BY USING SAME | (주)디엔에프 | 2025-01-02 | — | — | WO | disclosed |
| CN-118668177-A | Hafnium oxide film and preparation method and application thereof | 大连恒坤新材料有限公司 | 2024-09-20 | — | — | CN | disclosed |
| CN-117551119-A | Preparation method of novel dimer compound containing boron-nitrogen polar bond | 电子科技大学长三角研究院(湖州) | 2024-02-13 | — | — | CN | disclosed |
| CN-117551119-A | Preparation method of novel dimer compound containing boron-nitrogen polar bond | 电子科技大学长三角研究院(湖州) | 2024-02-13 | — | — | CN | disclosed |
| WO-2023239152-A1 | THIN FILM PRECURSOR COMPOUND, METHOD FOR FORMING THIN FILM BY USING SAME, AND SEMICONDUCTOR SUBSTRATE MANUFACTURED THEREBY | 솔브레인 주식회사 | 2023-12-14 | — | — | WO | disclosed |
| CN-116355019-A | Composition for vapor deposition of antimony-containing film, process for producing antimony-containing film, and antimony compound | DNF有限公司 | 2023-06-30 | — | — | CN | disclosed |
| US-20230203655-A1 | COMPOSITION FOR DEPOSITING ANTIMONY-CONTAINING THIN FILM AND METHOD FOR MANUFACTURING ANTIMONY-CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2023-06-29 | — | — | US | disclosed |
| CN-115028654-A | Method for producing zirconium tetra (dimethylamine) | 芯越芯(南京)电子科技有限公司 | 2022-09-09 | — | — | CN | disclosed |