Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.49 |
| ▸ | RAB9A | P51151 | 5/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.49 |
| ▸ | NLRP3 | Q96P20 | 2/20 | 0.49 |
| ▸ | APAF1 | O14727 | 1/20 | 0.44 |
| ▸ | PSMB5 | P28074 | 2/20 | 0.39 |
| ▸ | KDM1A | O60341 | 4/20 | 0.37 |
| ▸ | APP | P05067 | 2/20 | 0.36 |
| ▸ | TERT | O14746 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 4/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | EGFR | P00533 | 1/20 | 0.34 |
| ▸ | PDE3B | Q13370 | 1/20 | 0.34 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | BLM | P54132 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL2976942 | 0.99 | NPC1 (0.48) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| Hydrochloric Acid SCHEMBL866737 | 0.88 | APAF1 (0.57) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| SCHEMBL20555119 | 0.88 | APAF1 (0.57) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| SCHEMBL12908898 | 0.87 | NPC1 (0.51) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| Hydrochloric Acid SCHEMBL11156397 | 0.87 | NPC1 (0.60) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| SCHEMBL12107916 | 0.87 | NPC1 (0.60) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| SCHEMBL931054 | 0.85 | NPC1 (0.49) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| SCHEMBL2983242 | 0.85 | NPC1 (0.49) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| Hydrochloric Acid SCHEMBL2985575 | 0.85 | NPC1 (0.49) | NPC1RAB9AL3MBTL1NLRP3APAF1 | |
| SCHEMBL12908899 | 0.83 | NPC1 (0.47) | NPC1RAB9AL3MBTL1NLRP3APAF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | claimed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | claimed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | claimed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | claimed |
| US-7786303-B2 | Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-08-31 | — | — | US | disclosed |
| US-7786303-B2 | Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-08-31 | — | — | US | disclosed |
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | disclosed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | disclosed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | disclosed |