SCHEMBL29876754

SCHEMBL29876754

Cc1cc(C2(c3cc(C)c(OCC4CO4)c(C)c3)c3ccccc3-c3ccccc32)cc(C)c1OCC1CO1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
GLA P06280 1/20 0.47
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
TP53 P04637 3/20 0.42
TSHR P16473 3/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
HIF1A Q16665 2/20 0.42
CYP3A4 P08684 2/20 0.42
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
MAPT P10636 4/20 0.35
HPGD P15428 2/20 0.35
CYP1A2 P05177 2/20 0.35
PPARG P37231 1/20 0.35
NPSR1 Q6W5P4 2/20 0.34
LMNA P02545 3/20 0.34
KDM4E B2RXH2 1/20 0.34
OPRK1 P41145 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1673426 1.00 ALDH1A1 (0.47) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL10696550 0.93 TDP1 (0.47) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL10699374 0.92 ALDH1A1 (0.49) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL15835632 0.91 ESR1 (0.40) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL31275393 0.89 ESR1 (0.41) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL13816605 0.89 ALDH1A1 (0.40) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL17061462 0.89 ESR1 (0.40) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL17985079 0.88 ESR1 (0.39) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL19225098 0.87 ALDH1A1 (0.39) ALDH1A1GLAESR1ESR2TDP1
SCHEMBL10696825 0.87 PDK2 (0.41) ALDH1A1GLAESR1ESR2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115703939-A Curable composition, cured product, cured film, display panel, and method for producing cured film 东京应化工业株式会社 2023-02-17 CN disclosed
CN-115586701-A Photosensitive composition 东京应化工业株式会社 2023-01-10 CN disclosed
CN-115509087-A Photosensitive composition 东京应化工业株式会社 2022-12-23 CN disclosed
CN-115343912-A Photosensitive resin composition and application thereof 东京应化工业株式会社 2022-11-15 CN disclosed
CN-110198990-B Resin material and laminate 积水化学工业株式会社 2022-10-14 CN disclosed