⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7153912 | 0.97 | — | — | |
| Phosphine SCHEMBL7153914 | 0.97 | — | — | |
| Ethylene SCHEMBL9982853 | 0.94 | — | — | |
| SCHEMBL7644177 | 0.91 | — | — | |
| SCHEMBL7647795 | 0.87 | — | — | |
| Thiophene SCHEMBL27981613 | 0.83 | — | — | |
| SCHEMBL515428 | 0.83 | — | — | |
| SCHEMBL7035378 | 0.83 | — | — | |
| SCHEMBL7645558 | 0.83 | — | — | |
| SCHEMBL6814268 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6077571-A | VAPOR DEPOSITION; APPLYING ELECTRICAL BIAS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2000-06-20 | — | — | US | claimed |
| US-5312509-A | Manufacturing system for low temperature chemical vapor deposition of high purity metals | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-05-17 | — | — | US | claimed |
| JP-4267331-A | — | — | None | — | — | JP | disclosed |
| CN-116536644-A | Method of forming copper iodide layer and structure including copper iodide layer | ASM IP私人控股有限公司 | 2023-08-04 | — | — | CN | disclosed |
| EP-3301719-B1 | SOLID-STATE IMAGING DEVICE AND ELECTRONIC DEVICE | SONY GROUP CORP (JP) | 2022-07-27 | — | — | EP | disclosed |
| CN-112292478-A | Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials | ASM IP私人控股有限公司 | 2021-01-29 | — | — | CN | disclosed |
| CN-112292477-A | Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials | ASM IP私人控股有限公司 | 2021-01-29 | — | — | CN | disclosed |
| CN-103896222-B | The preparation method of ultrathin nanometer chip semiconductor material | UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA (CN) | 2016-01-20 | — | — | CN | disclosed |
| CN-103896222-A | Ultrathin nanosheet semiconductor material and preparation method and application thereof | USTC UNIV SCIENCE TECH CN | 2014-07-02 | — | — | CN | disclosed |
| CN-102177166-A | Method for producing mono-carboxyfunctionalized dialkylphosphinic acids and esters and salts thereof by means of vinylenes/nitriles and use thereof | CLARIANT FINANCE BVI LTD | 2011-09-07 | — | — | CN | disclosed |
| US-7777059-B2 | Copper(I) formate complexes | BASF SE (DE) | 2010-08-17 | — | — | US | disclosed |
| US-5312509-A | Manufacturing system for low temperature chemical vapor deposition of high purity metals | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-05-17 | — | — | US | disclosed |
| WO-1994007268-A1 | HIGH EFFICIENCY SOLAR PHOTOVOLTAIC CELLS PRODUCED WITH INEXPENSIVE MATERIALS BY PROCESSES SUITABLE FOR LARGE VOLUME PRODUCTION | MOWLES THOMAS A (US) | 1994-03-31 | — | — | WO | disclosed |
| EP-0528795-A1 | APPARATUS FOR LOW TEMPERATURE CVD OF METALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-03-03 | — | — | EP | disclosed |
| JP-H04267331-A | FORMATION OF COPPER THIN FILM | TOSHIBA CORP | 1992-09-22 | — | — | JP | disclosed |
| EP-0297348-B1 | METHOD FOR CHEMICAL VAPOR DEPOSITION OF COPPER, SILVER, AND GOLD USING A CYCLOPENTADIENYL METAL COMPLEX | International Business Machines Corporation (US) | 1992-03-04 | — | — | EP | disclosed |
| WO-1991017284-A1 | APPARATUS FOR LOW TEMPERATURE CVD OF METALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-11-14 | — | — | WO | disclosed |
| US-4948623-A | Method of chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl/metal complex | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1990-08-14 | — | — | US | disclosed |
| EP-0297348-A1 | Method for chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl metal complex | International Business Machines Corporation (US) | 1989-01-04 | — | — | EP | disclosed |
| US-3989806-A | Low temperature catalytic oxidation of chlorinated organic compounds to recover chlorine values | VULCAN MATERIALS COMPANY (US) | 1976-11-02 | — | — | US | disclosed |