⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2988710 | 0.83 | — | — | |
| SCHEMBL7647795 | 0.81 | — | — | |
| SCHEMBL7644177 | 0.80 | — | — | |
| Phosphine SCHEMBL7153914 | 0.80 | — | — | |
| SCHEMBL7153912 | 0.80 | — | — | |
| Ethylene SCHEMBL9982853 | 0.78 | — | — | |
| SCHEMBL9715239 | 0.75 | — | — | |
| SCHEMBL10580601 | 0.73 | — | — | |
| SCHEMBL7645558 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL11676668 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8841153-B2 | Method for producing a doped organic semiconducting layer | OSRAM OPTO SEMICONDUCTORS GMBH (DE) | 2014-09-23 | — | — | US | claimed |
| US-6174563-B1 | FORMING AN INTEGRATED CIRCUIT WHICH INCLUDES A METAL FILM LAYER FOR WIRING | NEC CORPORATION (JP) | 2001-01-16 | — | — | US | claimed |
| US-5627102-A | UNDERCOATING WITH A HIGH MELTING METAL OR COMPOUND | KAWASAKI STEEL CORPORATION (JP) | 1997-05-06 | — | — | US | claimed |
| US-5019531-A | Heating decomposition of organic copper or gold compound | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1991-05-28 | — | — | US | claimed |
| EP-0407081-A2 | Lithoplate production | Horsell Plc (GB) | 1991-01-09 | — | — | EP | claimed |
| US-4869930-A | Method for preparing substrates for deposition of metal seed from an organometallic vapor for subsequent electroless metallization | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1989-09-26 | — | — | US | claimed |
| JP-5299374-A | — | — | None | — | — | JP | disclosed |
| US-20260031365-A1 | ELECTROCATALYST STRUCTURES FOR AN ELECTRODE | UNIV WEST VIRGINIA (US) | 2026-01-29 | — | — | US | disclosed |
| WO-2025073702-A1 | PROCESS FOR PREPARING AROMATIC AMINES FROM ARYL CHLORIDES | BASF SE (DE) | 2025-04-10 | — | — | WO | disclosed |
| WO-2025045564-A1 | ISOCYANURATES | TECHNISCHE UNIVERSITÄT WIEN (AT) | 2025-03-06 | — | — | WO | disclosed |
| US-20220320526-A1 | ELECTROCATALYST STRUCTURES FOR AN ELECTRODE | WEST VIRGINIA UNIVERSITY | 2022-10-06 | — | — | US | disclosed |
| US-11316169-B2 | Methods for forming electrocatalyst structures and electrodes comprising same | WEST VIRGINIA UNIVERSITY (US) | 2022-04-26 | — | — | US | disclosed |
| US-10903257-B2 | Solid-state imaging device, driving method for solid-state imaging device, and electronic appliance | SONY SEMICONDUCTOR SOLUTIONS CORPORATION (JP) | 2021-01-26 | — | — | US | disclosed |
| US-4948623-A | Method of chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl/metal complex | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1990-08-14 | — | — | US | disclosed |
| US-4919971-A | Self-induced repairing of conductor lines | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1990-04-24 | — | — | US | disclosed |
| EP-0359930-A2 | Self-induced repairing of conductor lines | International Business Machines Corporation (US) | 1990-03-28 | — | — | EP | disclosed |
| US-4880670-A | Chemical vapor deposition of Group IB metals | GEORGIA TECH RESEARCH CORPORATION (US) | 1989-11-14 | — | — | US | disclosed |
| EP-0297348-A1 | Method for chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl metal complex | International Business Machines Corporation (US) | 1989-01-04 | — | — | EP | disclosed |
| EP-0297348-A1 | Method for chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl metal complex | International Business Machines Corporation (US) | 1989-01-04 | — | — | EP | disclosed |
| EP-0284441-A2 | II-VI Group compound crystal article and process for producing the same | CANON KABUSHIKI KAISHA (JP) | 1988-09-28 | — | — | EP | disclosed |