Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12603698 | 0.98 | ADORA3 (0.33) | ADORA3 | |
| SCHEMBL12040289 | 0.91 | — | — | |
| SCHEMBL10282813 | 0.90 | — | — | |
| SCHEMBL27436484 | 0.90 | — | — | |
| SCHEMBL27436504 | 0.90 | ADORA3 (0.31) | ADORA3 | |
| SCHEMBL12019766 | 0.89 | ADORA3 (0.31) | ADORA3 | |
| SCHEMBL14560599 | 0.89 | — | — | |
| SCHEMBL14750829 | 0.89 | — | — | |
| SCHEMBL27436569 | 0.89 | — | — | |
| SCHEMBL27436477 | 0.89 | ADORA3 (0.31) | ADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014034533-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2014-03-06 | — | — | WO | disclosed |
| WO-2013125733-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-08-29 | — | — | WO | disclosed |
| WO-2012008510-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | WO | disclosed |
| US-20120003437-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, PATTERN FILM, ANTIREFLECTION FILM, INSULATING FILM, OPTICAL DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |