Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL18889504 | 1.00 | LMNA (0.53) | LMNAALDH1A1ALOX15HSD17B10TDP1 | |
| Acrylic Acid SCHEMBL40229 | 1.00 | — | — | |
| Acrylic Acid SCHEMBL29572984 | 1.00 | LMNA (0.53) | LMNAALDH1A1ALOX15HSD17B10TDP1 | |
| Acrylic Acid SCHEMBL5884991 | 1.00 | LMNA (0.53) | LMNAALDH1A1ALOX15HSD17B10TDP1 | |
| Acrylic Acid SCHEMBL566319 | 0.97 | LMNA (0.50) | LMNAALDH1A1ALOX15HSD17B10TDP1 | |
| Benzene SCHEMBL9277815 | 0.95 | LMNA (0.48) | LMNAALDH1A1ALOX15HSD17B10TDP1 | |
| Acrylic Acid SCHEMBL8754533 | 0.93 | LMNA (0.46) | LMNAALDH1A1ALOX15HSD17B10 | |
| Acrylic Acid SCHEMBL566320 | 0.93 | LMNA (0.46) | LMNAALDH1A1ALOX15HSD17B10 | |
| Acrylic Acid SCHEMBL9566734 | 0.93 | LMNA (0.46) | LMNAALDH1A1ALOX15HSD17B10TSHR | |
| Acrylic Acid SCHEMBL29750571 | 0.85 | LMNA (0.48) | LMNAALDH1A1ALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115087927-A | Photosensitive film and method for producing photosensitive film | 富士胶片株式会社 | 2022-09-20 | — | — | CN | disclosed |