Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GBA1 | P04062 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6142601 | 0.61 | — | — | |
| SCHEMBL19012249 | 0.58 | EPHX1 (0.33) | — | |
| SCHEMBL24673853 | 0.58 | GBA1 (0.34) | GBA1 | |
| SCHEMBL561440 | 0.57 | — | — | |
| SCHEMBL1066102 | 0.57 | — | — | |
| SCHEMBL9904072 | 0.57 | — | — | |
| SCHEMBL19012424 | 0.56 | ALDH1A1 (0.33) | — | |
| SCHEMBL12764990 | 0.55 | UGT2B7 (0.36) | — | |
| SCHEMBL7920346 | 0.55 | — | — | |
| SCHEMBL11421394 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250224673-A1 | PHOTORESIST AND METHOD OF FORMATION AND USE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-07-10 | — | — | US | disclosed |
| US-12287575-B2 | Photoresist and method of formation and use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-04-29 | — | — | US | disclosed |
| US-20240393685-A1 | SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-11-28 | — | — | US | disclosed |
| US-20240387193-A1 | SEMICONDUCTOR DEVICES WITH EXTERNAL CONNECTORS | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-11-21 | — | — | US | disclosed |
| US-20240371640-A1 | UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-11-07 | — | — | US | disclosed |
| US-12074027-B2 | Underlayer of multilayer structure and methods of use thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-08-27 | — | — | US | disclosed |
| US-11977333-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-20240079235-A1 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-03-07 | — | — | US | disclosed |
| US-11842896-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-12 | — | — | US | disclosed |
| US-20230251571-A1 | Photoresist and Method of Formation and Use | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2023-08-10 | — | — | US | disclosed |
| US-11650500-B2 | Photoresist and method of formation and use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-05-16 | — | — | US | disclosed |
| US-20230064162-A1 | Semiconductor Device and Methods of Manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-03-02 | — | — | US | disclosed |
| US-20220392764-A1 | UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-12-08 | — | — | US | disclosed |
| US-20220367177-A1 | Semiconductor Devices and Methods of Manufacturing | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2022-11-17 | — | — | US | disclosed |