SCHEMBL29963642

SCHEMBL29963642

Nc1cc(N)c(N=Nc2cccc(N=Nc3cc(N=Nc4ccc(S(=O)(=O)O)cc4)c(N)cc3N)c2)cc1N=Nc1ccc(S(=O)(=O)O)cc1.[Na].[Na]

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PHLPP2 Q6ZVD8 2/20 0.62
▸ POLB P06746 1/20 0.58
▸ CYP2D6 P10635 1/20 0.58
▸ SENP2 Q9HC62 6/20 0.54
▸ SENP1 Q9P0U3 5/20 0.54
▸ SENP3 Q9H4L4 4/20 0.54
▸ SUMO2 P61956 4/20 0.54
▸ SUMO1 P63165 4/20 0.54
▸ SENP7 Q9BQF6 4/20 0.54
▸ CYP2C9 P11712 1/20 0.47
▸ CYP2C19 P33261 1/20 0.47
▸ HSD17B10 Q99714 1/20 0.47
▸ ATIC P31939 1/20 0.47
▸ RPS6KA3 P51812 1/20 0.47
▸ CA12 O43570 2/20 0.47
▸ CA2 P00918 2/20 0.47
▸ CA9 Q16790 2/20 0.47
▸ GLO1 Q04760 3/20 0.46
▸ MEN1 O00255 1/20 0.43
▸ ALDH1A1 P00352 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29709392 0.85 SLC7A11 (0.51) PHLPP2POLBSENP2SENP1SENP3
SCHEMBL19982588 0.85 PHLPP2 (0.59) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL11239206 0.82 NPC1 (0.59) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL11239208 0.82 NPC1 (0.59) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL15293552 0.82 NPC1 (0.59) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL9613351 0.79 PHLPP2 (0.53) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL15296966 0.79 PHLPP2 (0.54) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL4598070 0.79 POLB (0.72) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL4598066 0.79 POLB (0.72) PHLPP2POLBCYP2D6SENP2SENP1
SCHEMBL11242221 0.77 BRD4 (0.64) PHLPP2POLBCYP2D6SENP2SUMO2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3778803-B1 WATER-BASED INKJET COMPOSITION AND METHOD FOR MANUFACTURING RECORDED MATTER SEIKO EPSON CORP (JP) 2026-03-18 — — EP disclosed
EP-4703437-A1 ULTRAVIOLET-CURABLE COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, CURED PRODUCT, ULTRAVIOLET-CURABLE INK, METHOD FOR PRODUCING PRINTED MATTER, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2026-03-04 — — EP disclosed
EP-4703438-A1 ULTRAVIOLET-CURABLE COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, CURED PRODUCT, ULTRAVIOLET-CURABLE INK, METHOD FOR PRODUCING PRINTED MATTER, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2026-03-04 — — EP disclosed
US-12312483-B2 Ink jet composition SEIKO EPSON CORPORATION (JP) 2025-05-27 — — US disclosed
EP-3617284-B1 INK JET PRINTING PENETRANT, INK JET PRINTING INK SET, AND INK JET PRINTING METHOD SEIKO EPSON CORP (JP) 2025-02-19 — — EP disclosed
US-12091562-B2 Composition for aqueous ink jet and method for producing recorded product SEIKO EPSON CORPORATION (JP) 2024-09-17 — — US disclosed
CN-115125741-B Treatment liquid composition, composition set, treatment method and printing and dyeing method 精工爱普生株式会社 2023-11-24 — — CN disclosed
CN-111073392-B Ink for ink-jet printing 精工爱普生株式会社 2023-10-03 — — CN disclosed
US-20230257606-A1 Ink Jet Composition SEIKO EPSON CORPORATION (JP) 2023-08-17 — — US disclosed
CN-116587738-A Inkjet composition 精工爱普生株式会社 2023-08-15 — — CN disclosed
EP-3296363-B1 AZO DYES KEMIRA OYJ (FI) 2023-06-21 — — EP disclosed
CN-110863378-B Penetrating fluid for inkjet printing, ink set for inkjet printing, and inkjet printing method 精工爱普生株式会社 2023-06-16 — — CN disclosed
US-11667805-B2 Processing liquid composition, composition set, processing method, and textile printing method SEIKO EPSON CORPORATION 2023-06-06 — — US disclosed
CN-111954702-B Aqueous inkjet composition and method for producing recorded matter 精工爱普生株式会社 2022-11-15 — — CN disclosed
US-20220325471-A1 Fabric Processing Method, Processed Fabric, Textile Printing Method, And Composition Set SEIKO EPSON CORPORATION (JP) 2022-10-13 — — US disclosed
US-20220315787-A1 Processing Liquid Composition, Composition Set, Processing Method, And Textile Printing Method SEIKO EPSON CORPORATION (JP) 2022-10-06 — — US disclosed
CN-115125741-A Treatment liquid composition, composition set, treatment method and printing and dyeing method 精工爱普生株式会社 2022-09-30 — — CN disclosed
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