SCHEMBL2997147

SCHEMBL2997147

C[O-].C[O-].C[O-].C[O-].C[O-].C[O-].[Ba+2].[Ti+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL490306 0.89
SCHEMBL16039 0.89
SCHEMBL2993940 0.80
SCHEMBL2998640 0.80
Hydrochloric Acid SCHEMBL8367714 0.80
Water SCHEMBL21569389 0.80
Hydrochloric Acid SCHEMBL9066525 0.80
SCHEMBL2988878 0.80
Methyl Alcohol SCHEMBL10386252 0.73
Water SCHEMBL5129118 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9214279-B2 Ultrafine metal oxide particle dispersion liquid and ultrafine metal oxide particle thin film MURATA MANUFACTURING CO., LTD. (JP) 2015-12-15 US disclosed
EP-2770510-A1 DIELECTRIC FILM AND TRANSDUCER USING SAME Tokai Rubber Industries, Ltd. (JP) 2014-08-27 EP disclosed
US-20140004364-A1 DIELECTRIC FILM AND TRANSDUCER INCLUDING THE SAME TOKAI RUBBER INDUSTRIES, LTD. (JP) 2014-01-02 US disclosed
US-20100183803-A1 ULTRAFINE METAL OXIDE PARTICLE DISPERSION LIQUID AND ULTRAFINE METAL OXIDE PARTICLE THIN FILM MURATA MANUFACTURING CO., LTD. (JP) 2010-07-22 US disclosed
US-20050194573-A1 Ultrafine metal oxide particle dispersion liquid and ultrafine metal oxide particle thin film MURATA MANUFACTURING CO., LTD. 2005-09-08 US disclosed