SCHEMBL29974232

SCHEMBL29974232

C=CC/C(C(=O)O)=C(\CC=C)C(=O)O.C=CCOC(=O)/C=C\C(=O)OCC=C

nearest known ligand 0.53

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.53
CACNA1B Q00975 1/20 0.53
APBA1 Q02410 1/20 0.53
APP P05067 1/20 0.41
HCAR2 Q8TDS4 6/20 0.35
CYP3A4 P08684 2/20 0.35
TSHR P16473 2/20 0.33
CYP2C9 P11712 1/20 0.32
ATM Q13315 1/20 0.31
PKM P14618 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CASP1 P29466 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29973550 1.00 MAPT (0.53) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL30122610 1.00 MAPT (0.53) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL16581330 0.86 MAPT (0.42) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL27705294 0.84 MAPT (0.56) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL6885967 0.83 MAPT (0.69) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL36375 0.83 MAPT (0.69) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL36140 0.83 MAPT (0.69) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL36139 0.83 MAPT (0.69) MAPTCACNA1BAPBA1APPHCAR2
SCHEMBL2938491 0.82 CYP3A4 (0.36) MAPTCACNA1BAPBA1CYP3A4TSHR
SCHEMBL2936819 0.82 CYP3A4 (0.36) MAPTCACNA1BAPBA1CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118742684-A Solid state process for treating synthetic thermoplastic articles 绿色主题技术股份有限公司 2024-10-01 CN disclosed
CN-115677932-A Copolymer, film composition comprising the same, and composite material 财团法人工业技术研究院 2023-02-03 CN disclosed
CN-115128904-A Photosensitive composition and film formed therefrom 财团法人工业技术研究院 2022-09-30 CN disclosed