Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.56 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CNR2 | P34972 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2192154 | 1.00 | TDP1 (0.56) | TDP1HTTLMNAHDAC6KMT2A | |
| SCHEMBL218011 | 0.95 | TDP1 (0.56) | TDP1LMNAHDAC6 | |
| SCHEMBL12879054 | 0.94 | TDP1 (0.54) | TDP1LMNAHDAC6KMT2A | |
| SCHEMBL15865073 | 0.92 | TDP1 (0.51) | TDP1LMNAHDAC6KMT2A | |
| Vinyl Ether SCHEMBL9713768 | 0.91 | TDP1 (0.51) | TDP1LMNAHDAC6 | |
| SCHEMBL216569 | 0.88 | TDP1 (0.73) | TDP1LMNAKMT2ACNR2 | |
| SCHEMBL209607 | 0.87 | TDP1 (0.71) | TDP1LMNAHDAC6KMT2A | |
| SCHEMBL16684723 | 0.86 | TDP1 (0.56) | TDP1HTTLMNA | |
| SCHEMBL4624467 | 0.86 | SERPINE1 (0.47) | TDP1LMNAKMT2A | |
| SCHEMBL9436550 | 0.86 | TDP1 (0.69) | TDP1LMNAHDAC6KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025041813-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY | 日産化学株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-20240302744-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-12 | — | — | US | disclosed |
| US-11961636-B2 | Silica-containing insulating composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-16 | — | — | US | disclosed |
| WO-2024024501-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2024-02-01 | — | — | WO | disclosed |
| EP-3680918-B1 | SILICA-CONTAINING INSULATING COMPOSITION | NISSAN CHEMICAL CORP (JP) | 2023-12-27 | — | — | EP | disclosed |
| US-11674053-B2 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| WO-2022210960-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |