SCHEMBL2998331

SCHEMBL2998331

Cc1cc(N)cc(C)c1Oc1ccc(-c2ccc(Oc3c(C)cc(N)cc3C)cc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.45
SMN1; SMN2 Q16637 5/20 0.45
TEAD4 Q15561 1/20 0.43
MAPT P10636 4/20 0.42
TDP1 Q9NUW8 3/20 0.42
POLB P06746 1/20 0.42
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
HPGD P15428 3/20 0.41
CYP3A4 P08684 2/20 0.41
TSHR P16473 2/20 0.41
MITF O75030 1/20 0.38
GAA P10253 1/20 0.38
GFER P55789 1/20 0.38
NLRP1 Q9C000 1/20 0.38
NOD2 Q9HC29 1/20 0.38
PTGS2 P35354 1/20 0.38
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
NLRP3 Q96P20 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2999317 0.94 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL3000872 0.91 ALDH1A1 (0.54) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL10804584 0.89 ALDH1A1 (0.57) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL25968198 0.88 TEAD4 (0.59) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL8915864 0.86 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL22966192 0.86 TDP1 (0.52) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL11717267 0.84 MAPT (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL28793299 0.84 MEN1 (0.48) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL8004946 0.83 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL12675065 0.83 KMT2A (0.50) ALDH1A1SMN1; SMN2TEAD4MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11885694-B2 Temperature sensor element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-30 US disclosed
US-11674920-B2 Moisture-sensitive film and sensor using same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
CN-111133032-B Polyimide, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2022-07-19 CN disclosed
US-20220082452-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-17 US disclosed
US-20220065707-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-03 US disclosed
US-20220065708-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-03 US disclosed
US-11261303-B2 Polyimide resin film and method for producing polyimide resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-03-01 US disclosed
US-20210381905-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-09 US disclosed
US-20210364368-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-11-25 US disclosed
EP-3489284-B1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2021-06-09 EP disclosed
US-20210055247-A1 MOISTURE-SENSITIVE FILM AND SENSOR USING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-02-25 US disclosed
US-20190185631-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-06-20 US disclosed
EP-3489284-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2019-05-29 EP disclosed
US-9193850-B2 Nanocomposite, process for preparing the same, and surface emitting device SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-24 US disclosed
US-20130037786-A1 NANOCOMPOSITE, PROCESS FOR PREPARING THE SAME, AND SURFACE EMITTING DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-02-14 US disclosed
US-8357322-B2 Process and apparatus for production of colorless transparent resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-22 US disclosed
EP-2147766-B1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2012-08-01 EP disclosed
US-20100187719-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-07-29 US disclosed
EP-2147766-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-01-27 EP disclosed