SCHEMBL29986638

SCHEMBL29986638

c1ccc2cc3c(-c4cccc5c4[nH]c4ccccc45)cccc3cc2c1

nearest known ligand 0.51

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 4/20 0.51
▸ BCHE P06276 1/20 0.50
▸ PARP14 Q460N5 14/20 0.48
▸ HTR2B P41595 1/20 0.44
▸ HTR5A P47898 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10935819 1.00 KIF11 (0.51) KIF11BCHEPARP14HTR2BHTR5A
SCHEMBL27706818 0.88 KIF11 (0.50) KIF11BCHEPARP14HTR2BHTR5A
SCHEMBL31536118 0.86 KIF11 (0.53) KIF11BCHEPARP14HTR2BHTR5A
SCHEMBL147411 0.86 BCHE (0.64) KIF11BCHEPARP14
SCHEMBL29986487 0.86 BCHE (0.64) KIF11BCHEPARP14
SCHEMBL28066196 0.85 KIF11 (0.53) KIF11BCHEPARP14
SCHEMBL27697523 0.85 KIF11 (0.53) KIF11BCHEPARP14
SCHEMBL29733506 0.84 KIF11 (0.63) KIF11BCHEPARP14
SCHEMBL208113 0.84 KIF11 (0.63) KIF11BCHEPARP14
SCHEMBL29997375 0.82 KIF11 (0.51) KIF11BCHEPARP14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 — — CN claimed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 — — CN claimed
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 — — CN disclosed
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 — — CN disclosed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 — — CN disclosed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 — — CN disclosed
WO-2023063163-A1 MIXED POWDER FOR ORGANIC ELECTROLUMINESCENT ELEMENT, PRODUCTION METHOD THEREFOR, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT USING SAID MIXED POWDER, METHOD FOR SELECTING COMPOUND IN SAID MIXED POWDER, AND COMPOSITION FOR VACUUM DEPOSITION 出光興産株式会社 2023-04-20 — — WO disclosed
US-20230001447-A1 MIXED POWDER, METHOD OF VAPOR-DEPOSITING ORGANIC COMPOUND, METHOD OF FABRICATING ORGANIC ELECTROLUMINESCENCE DEVICE, METHOD OF SELECTING ORGANIC COMPOUNDS, AND METHOD OF VAPOR-DEPOSITING IDEMITSU KOSAN CO.,LTD. (JP) 2023-01-05 — — US disclosed
WO-2022270428-A1 MIXED POWDER FOR ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING MIXED POWDER, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT USING MIXED POWDER, METHOD FOR SELECTING COMPOUND IN MIXED POWDER, AND COMPOSITION FOR VACUUM DEPOSITION 出光興産株式会社 2022-12-29 — — WO disclosed
WO-2022270423-A1 MIXED POWDER FOR ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING MIXED POWDER, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT USING MIXED POWDER, METHOD FOR SELECTING COMPOUND IN MIXED POWDER, AND COMPOSITION FOR VACUUM DEPOSITION 出光興産株式会社 2022-12-29 — — WO disclosed
WO-2022270430-A1 MIXED POWDER, MIXTURE, AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT 出光興産株式会社 2022-12-29 — — WO disclosed
US-11411182-B1 Mixed powder for organic electroluminescence device and method of producing the same, method of fabricating organic electroluminescence device using the mixed powder, method of selecting compounds for the mixed powder, and composition for vacuum vapor deposition IDEMITSU KOSAN CO., LTD. (JP) 2022-08-09 — — US disclosed
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