⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL50020 | 1.00 | — | — | |
| SCHEMBL15954901 | 0.91 | — | — | |
| SCHEMBL8627358 | 0.91 | — | — | |
| Fluoride SCHEMBL27720944 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL6870529 | 0.91 | — | — | |
| SCHEMBL26338382 | 0.89 | — | — | |
| SCHEMBL27777051 | 0.89 | — | — | |
| SCHEMBL45345 | 0.89 | — | — | |
| Strontium SCHEMBL5886585 | 0.84 | — | — | |
| Calcium SCHEMBL8630626 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104241319-B | Organic light emitting diode display | 三星显示有限公司 | 2019-05-28 | — | — | CN | claimed |
| US-9896549-B2 | Hydrophobic and oleophobic coatings | UNIVERSITY OF WEST VIRGINIA | 2018-02-20 | — | — | US | claimed |
| EP-2190641-B1 | SILICONE MOLD AND USE THEREOF | 3M INNOVATIVE PROPERTIES CO (US) | 2012-10-03 | — | — | EP | claimed |
| EP-1171396-B1 | SILICEOUS SUBSTRATE WITH A SILANE LAYER AND ITS MANUFACTURE | ICT COATINGS N V (BE) | 2003-05-28 | — | — | EP | claimed |
| EP-1171396-A1 | SILICEOUS SUBSTRATE WITH A SILANE LAYER AND ITS MANUFACTURE | ICT Coatings N.V. (BE) | 2002-01-16 | — | — | EP | claimed |
| WO-2000063129-A1 | SILICEOUS SUBSTRATE WITH A SILANE LAYER AND ITS MANUFACTURE | ICT COATINGS N.V. (BE) | 2000-10-26 | — | — | WO | claimed |
| EP-0953066-A1 | INDUCTIVELY COUPLED PLASMA CVD | LAM RESEARCH CORPORATION (US) | 1999-11-03 | — | — | EP | claimed |
| WO-1998028465-A1 | INDUCTIVELY COUPLED PLASMA CVD | LAM RESEARCH CORPORATION (US) | 1998-07-02 | — | — | WO | claimed |
| US-20240090214-A1 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME | SK Hynix Inc. (KR) | 2024-03-14 | — | — | US | disclosed |
| US-20230317636-A1 | SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF | SK Hynix Inc. (KR) | 2023-10-05 | — | — | US | disclosed |
| CN-113471096-A | Method and system for detecting process chamber conditions and computer readable medium | 台湾积体电路制造股份有限公司 | 2021-10-01 | — | — | CN | disclosed |
| US-9896549-B2 | Hydrophobic and oleophobic coatings | UNIVERSITY OF WEST VIRGINIA | 2018-02-20 | — | — | US | disclosed |
| US-9293410-B2 | Semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-03-22 | — | — | US | disclosed |
| EP-2427278-B1 | MEDICINAL INHALATION DEVICES AND COMPONENTS THEREOF | 3M INNOVATIVE PROPERTIES CO (US) | 2015-09-23 | — | — | EP | disclosed |
| US-20030104679-A1 | Backside metallization on microelectronic dice having beveled sides for effective thermal contact with heat dissipation devices | INTEL CORPORATION | 2003-06-05 | — | — | US | disclosed |
| EP-1171396-B1 | SILICEOUS SUBSTRATE WITH A SILANE LAYER AND ITS MANUFACTURE | ICT COATINGS N V (BE) | 2003-05-28 | — | — | EP | disclosed |
| US-6379448-B1 | KITS FOR APPLYING SILANE TO SUBSTRATE A FLUOROPOLYSILOXANE LAYER | ICT COATINGS N.V. (BE) | 2002-04-30 | — | — | US | disclosed |
| EP-1171396-A1 | SILICEOUS SUBSTRATE WITH A SILANE LAYER AND ITS MANUFACTURE | ICT Coatings N.V. (BE) | 2002-01-16 | — | — | EP | disclosed |
| CN-1304172-A | Method for manufacturing semiconductor device | MITSUBISHI ELECTRIC MACHINERY (JP) | 2001-07-18 | — | — | CN | disclosed |
| WO-2000063129-A1 | SILICEOUS SUBSTRATE WITH A SILANE LAYER AND ITS MANUFACTURE | ICT COATINGS N.V. (BE) | 2000-10-26 | — | — | WO | disclosed |