SCHEMBL299944

SCHEMBL299944

CCCCCc1cccc2[nH]nnc12

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.40
PTGS2 P35354 2/20 0.40
ALOX5 P09917 1/20 0.40
KCNH2 Q12809 1/20 0.40
BID P55957 3/20 0.38
MCL1 Q07820 3/20 0.38
BCL2L1 Q07817 2/20 0.38
BAK1 Q16611 2/20 0.38
KAT8 Q9H7Z6 2/20 0.38
PPARG P37231 1/20 0.38
PPARA Q07869 1/20 0.38
EP300 Q09472 1/20 0.38
KAT2A Q92830 1/20 0.38
KAT2B Q92831 1/20 0.38
KAT5 Q92993 1/20 0.38
SAE1 Q9UBE0 1/20 0.38
TLR8 Q9NR97 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29466095 1.00 LIPG (0.40) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL28043410 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL8406883 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL27635841 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL29743329 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL28479318 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL8633987 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL461413 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL460020 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID
SCHEMBL8664501 0.98 LIPG (0.42) LIPGPTGS2ALOX5KCNH2BID

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 528 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
EP-3672944-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-08-07 EP claimed
US-20240174924-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-05-30 US claimed
EP-3719105-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2023-09-27 EP claimed
WO-2023122497-A1 MICROGELS, METHODS OF MAKING MICROGELS AND METHODS OF USING MICROGELS UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2023-06-29 WO claimed
CN-110997643-B Cleaning composition 富士胶片电子材料美国有限公司 2023-06-06 CN claimed
CN-116171309-A Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2023-05-26 CN claimed
US-20230159864-A1 TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED FUJIFILM CORPORATION (JP) 2023-05-25 US claimed
US-20150267112-A1 Etching Composition FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-09-24 US claimed
WO-2015142778-A1 ETCHING COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-09-24 WO claimed
WO-2015089023-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-18 WO claimed
WO-2015084921-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-11 WO claimed
US-20150159125-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
US-20150159124-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
WO-2015060954-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-04-30 WO claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed
US-20040180800-A1 Cleaning and protecting composition with antioxidant and UV light resistance and method of use HOMECARE LABS, INC. 2004-09-16 US claimed
EP-0256331-B1 N1-SUBSTITUTED 1H-BENZOTRIAZOLE-HYDROXYETHYL-SULFONE COMPOUNDS, PROCESS FOR THEIR PREPARATION AND THEIR USE IN THE PREPARATION OF DYES HOECHST AKTIENGESELLSCHAFT (DE) 1991-11-06 EP claimed