SCHEMBL30003516

SCHEMBL30003516

CCOc1c2c(c(OC)c3ccccc13)CCCC2

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.47
KDM4E B2RXH2 3/20 0.47
MAPK1 P28482 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
HPGD P15428 1/20 0.45
PTGER4 P35408 9/20 0.44
POLB P06746 2/20 0.40
GAA P10253 1/20 0.40
TSHR P16473 1/20 0.40
MAPT P10636 1/20 0.36
SYK P43405 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
MEN1 O00255 1/20 0.35
USP2 O75604 1/20 0.35
KMT2A Q03164 1/20 0.35
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23271880 1.00 ALDH1A1 (0.47) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL23271833 0.93 PTGER4 (0.48) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL30003141 0.93 PTGER4 (0.48) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL23271852 0.87 ALDH1A1 (0.61) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL30003354 0.87 ALDH1A1 (0.61) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL23271649 0.85 SMN1; SMN2 (0.42) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL30003096 0.85 SMN1; SMN2 (0.42) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL14295095 0.85 PTGER4 (0.43) ALDH1A1KDM4EHPGDPTGER4POLB
SCHEMBL23271839 0.84 ALDH1A1 (0.48) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD
SCHEMBL30003187 0.84 ALDH1A1 (0.48) ALDH1A1KDM4EMAPK1SMN1; SMN2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 CN disclosed