SCHEMBL30004116

SCHEMBL30004116

COCCOc1ccc(OCCOC)c2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.50
KDM4E B2RXH2 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
GPR84 Q9NQS5 1/20 0.44
MPO P05164 1/20 0.44
KDM1A O60341 3/20 0.43
HTR1B P28222 5/20 0.43
TSHR P16473 1/20 0.43
HTR1D P28221 1/20 0.43
SLC6A4 P31645 1/20 0.42
HRH1 P35367 1/20 0.42
CNR1 P21554 1/20 0.41
CNR2 P34972 1/20 0.41
MAPK1 P28482 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18561726 1.00 IDO1 (0.50) IDO1KDM4ESMN1; SMN2GPR84MPO
SCHEMBL18561724 0.94 IDO1 (0.52) IDO1KDM4ESMN1; SMN2GPR84
SCHEMBL18574221 0.91 HTR1B (0.47) SMN1; SMN2KDM1AHTR1BHTR1DSLC6A4
SCHEMBL16065361 0.90 CYP1A2 (0.48) IDO1KDM4ESMN1; SMN2GPR84MPO
SCHEMBL3173942 0.89 IDO1 (0.69) IDO1KDM4ESMN1; SMN2GPR84KDM1A
SCHEMBL7759419 0.89 KDM4E (0.49) IDO1KDM4ESMN1; SMN2
SCHEMBL13671720 0.89 KDM4E (0.60) KDM4ESMN1; SMN2GPR84TSHRMAPK1
SCHEMBL18561728 0.85 SMN1; SMN2 (0.48) IDO1SMN1; SMN2GPR84KDM1AHTR1B
SCHEMBL12745148 0.84 GPR84 (0.47) IDO1KDM4ESMN1; SMN2GPR84
SCHEMBL12745094 0.84 KDM4E (0.68) KDM4ESMN1; SMN2GPR84MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 CN disclosed