SCHEMBL30006027

SCHEMBL30006027

c1ccc(-c2ccc3ccccc3c2-c2cccc3ccccc23)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNMT1 P26358 1/20 0.48
ALDH1A1 P00352 4/20 0.46
MAPT P10636 3/20 0.46
KDM4E B2RXH2 3/20 0.46
HPGD P15428 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
TSHR P16473 2/20 0.46
HSD17B10 Q99714 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
TP53 P04637 1/20 0.46
NFKB1 P19838 1/20 0.46
MAPK1 P28482 1/20 0.46
NFKB2 Q00653 1/20 0.46
RELA Q04206 1/20 0.46
ATM Q13315 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
TNF P01375 1/20 0.46
DHFR P00374 1/20 0.45
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18260187 1.00 DNMT1 (0.48) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL25210795 0.91 HPRT1 (0.47) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL30021047 0.91 HPRT1 (0.47) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL2878648 0.88 DNMT1 (0.53) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL30332655 0.88 MAPT (0.46) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL29268789 0.88 ALDH1A1 (0.44) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL28386170 0.88 ALDH1A1 (0.46) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL31603915 0.87 ALDH1A1 (0.50) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL17442108 0.87 ALDH1A1 (0.50) DNMT1ALDH1A1MAPTKDM4EHPGD
SCHEMBL25571722 0.86 CA12 (0.40) DNMT1ALDH1A1MAPTKDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4676999-A1 SULFUR-CONTAINING HETEROCYCLIC COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-14 EP disclosed
WO-2024185904-A1 SULFUR-CONTAINING HETEROCYCLIC COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-09-12 WO disclosed
CN-115448932-A Compound, organic photoelectric device and display or lighting device 上海钥熠电子科技有限公司 2022-12-09 CN disclosed