Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | F2 | P00734 | 2/20 | 0.56 |
| ▸ | MASP2 | O00187 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 10/20 | 0.49 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.46 |
| ▸ | MEN1 | O00255 | 5/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 4/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.42 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 3/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3003413 | 1.00 | F2 (0.56) | F2MASP2MAPTHCAR2ALDH1A1 | |
| SCHEMBL11153607 | 0.98 | F2 (0.55) | F2MASP2MAPTHCAR2ALDH1A1 | |
| SCHEMBL11153560 | 0.98 | F2 (0.55) | F2MASP2MAPTHCAR2ALDH1A1 | |
| SCHEMBL9298138 | 0.89 | F2 (0.67) | F2MASP2MAPTHCAR2ALDH1A1 | |
| SCHEMBL9298131 | 0.89 | F2 (0.67) | F2MASP2MAPTHCAR2ALDH1A1 | |
| SCHEMBL10745928 | 0.84 | — | — | |
| SCHEMBL10745931 | 0.84 | — | — | |
| SCHEMBL2167348 | 0.84 | — | — | |
| SCHEMBL2167346 | 0.84 | — | — | |
| SCHEMBL629218 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105461670-B | 1- (2- furyl) -1,3- pentadiene class compound and preparation method thereof, application | 西华大学 | 2018-12-04 | — | — | CN | claimed |
| CN-105461670-A | 1-(2-furyl)-1,3-pentadiene compounds as well as preparation method and application thereof | UNIV XIHUA | 2016-04-06 | — | — | CN | claimed |
| US-8207059-B2 | Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device | FUJITSU LIMITED (JP) | 2012-06-26 | — | — | US | claimed |
| US-7830012-B2 | Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing light; blocks ultraviolet light applied to a porous insulating film | FUJITSU LIMITED (JP) | 2010-11-09 | — | — | US | claimed |
| US-20100176496-A1 | MATERIAL FOR FORMING EXPOSURE LIGHT-BLOCKING FILM, MULTILAYER INTERCONNECTION STRUCTURE AND MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-07-15 | — | — | US | claimed |
| US-7728065-B2 | Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing exposure light; high exposure light (particularly ultraviolet light) absorptivity, which efficiently blocks the exposure light that reaches porous insulating films | FUJITSU LIMITED (JP) | 2010-06-01 | — | — | US | claimed |
| EP-2028215-A1 | Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device | Fujitsu Limited (JP) | 2009-02-25 | — | — | EP | claimed |
| US-20090038833-A1 | SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING MULTILAYER WIRING DEVICE AND MULTILAYER WIRING DEVICE | FUJITSU LIMITED (JP) | 2009-02-12 | — | — | US | claimed |
| US-20070190461-A1 | Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing exposure light; high exposure light (particularly ultraviolet light) absorptivity, which efficiently blocks the exposure light that reaches porous insulating films | FUJITSU LIMITED (JP) | 2007-08-16 | — | — | US | claimed |
| CN-105461670-B | 1- (2- furyl) -1,3- pentadiene class compound and preparation method thereof, application | 西华大学 | 2018-12-04 | — | — | CN | disclosed |
| CN-105461670-B | 1- (2- furyl) -1,3- pentadiene class compound and preparation method thereof, application | 西华大学 | 2018-12-04 | — | — | CN | disclosed |
| CN-105461670-B | 1- (2- furyl) -1,3- pentadiene class compound and preparation method thereof, application | 西华大学 | 2018-12-04 | — | — | CN | disclosed |
| EP-2028215-B1 | SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING MULTILAYER WIRING DEVICE AND MULTILAYER WIRING DEVICE | FUJITSU LTD (JP) | 2018-08-01 | — | — | EP | disclosed |
| CN-105461670-A | 1-(2-furyl)-1,3-pentadiene compounds as well as preparation method and application thereof | UNIV XIHUA | 2016-04-06 | — | — | CN | disclosed |
| US-20100133692-A1 | PROCESS FOR PRODUCING SILICIC COATING, SILICIC COATING AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-06-03 | — | — | US | disclosed |
| US-7728065-B2 | Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing exposure light; high exposure light (particularly ultraviolet light) absorptivity, which efficiently blocks the exposure light that reaches porous insulating films | FUJITSU LIMITED (JP) | 2010-06-01 | — | — | US | disclosed |
| CN-101649053-A | Silicon compound, multilayer wiring device , method for manufacturing the same | FUJITSU LTD JP | 2010-02-17 | — | — | CN | disclosed |
| EP-2028215-A1 | Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device | Fujitsu Limited (JP) | 2009-02-25 | — | — | EP | disclosed |
| US-20090038833-A1 | SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING MULTILAYER WIRING DEVICE AND MULTILAYER WIRING DEVICE | FUJITSU LIMITED (JP) | 2009-02-12 | — | — | US | disclosed |
| US-20070190461-A1 | Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing exposure light; high exposure light (particularly ultraviolet light) absorptivity, which efficiently blocks the exposure light that reaches porous insulating films | FUJITSU LIMITED (JP) | 2007-08-16 | — | — | US | disclosed |