⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9186658 | 0.80 | — | — | |
| SCHEMBL14672638 | 0.76 | EPHX1 (0.35) | — | |
| SCHEMBL6702820 | 0.73 | — | — | |
| SCHEMBL1136095 | 0.71 | — | — | |
| SCHEMBL28431687 | 0.71 | — | — | |
| SCHEMBL5246875 | 0.71 | — | — | |
| SCHEMBL2686675 | 0.70 | — | — | |
| Ammonia Solution, Strong SCHEMBL3679851 | 0.70 | — | — | |
| SCHEMBL3358813 | 0.70 | — | — | |
| SCHEMBL249629 | 0.69 | OPRM1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250223479-A1 | CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD FOR POLISHING TUNGSTEN USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-07-10 | — | — | US | claimed |
| US-20230324267-A1 | DEVICE FOR REDUCING THE VOLUME OF A SAMPLE, A KIT COMPRISING THE SAME, AND USES THEREOF | CHUNG YUAN CHRISTIAN UNIVERSITY (TW) | 2023-10-12 | — | — | US | claimed |
| CN-114874744-A | Mildew-proof beauty glue for interior decoration and preparation method thereof | 福建省三棵树新材料有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-113540423-A | High-stability silicon-carbon composite negative electrode material, preparation method thereof and lithium ion battery | 洛阳月星新能源科技有限公司 | 2021-10-22 | — | — | CN | claimed |
| CN-109401603-B | Polyurea elastomer anticorrosive material and preparation and use method thereof | 成都硅宝科技股份有限公司 | 2020-07-17 | — | — | CN | claimed |
| CN-106753178-B | Two-component polyurethane sealant and preparation method thereof | 成都硅宝科技股份有限公司 | 2020-04-14 | — | — | CN | claimed |
| EP-3307816-A1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | Bison International B.v. (NL) | 2018-04-18 | — | — | EP | claimed |
| US-9758689-B2 | Silver nanoparticle inks comprising aminomethylsilanes | XEROX CORPORATION (US) | 2017-09-12 | — | — | US | claimed |
| WO-2016202359-A1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | BISON INTERNATIONAL B.V. (NL) | 2016-12-22 | — | — | WO | claimed |
| US-8709959-B2 | Puncture resistant fabric | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2014-04-29 | — | — | US | claimed |
| EP-2010588-B1 | Organosilicon polyurea polymers, elastomers manufactured therefrom and their use | HENKEL AG & CO KGAA (DE) | 2012-01-04 | — | — | EP | claimed |
| EP-4047051-B1 | COMPOSITION FOR ENCAPSULANT FILM COMPRISING ETHYLENE/ALPHA-OLEFIN COPOLYMER AND ENCAPSULANT FILM COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2026-05-20 | — | — | EP | disclosed |
| US-12552962-B2 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | disclosed |
| EP-4450549-B1 | ENCAPSULANT FILM COMPOSITION AND ENCAPSULANT FILM COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-12-10 | — | — | EP | disclosed |
| EP-4645499-A1 | SEPARATOR FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-11-05 | — | — | EP | disclosed |
| WO-2011080649-A2 | PUNCTURE RESISTANT FABRIC | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2011-07-07 | — | — | WO | disclosed |
| US-20110159759-A1 | Puncture Resistant Fabric | KIMBERLY-CLARK WORLDWIDE, INC. | 2011-06-30 | — | — | US | disclosed |
| US-20110155141-A1 | Wearable Article That Stiffens Upon Sudden Force | KIMBERLY-CLARK WORLDWIDE, INC. | 2011-06-30 | — | — | US | disclosed |
| US-20090260297-A1 | Hydrophilic and hydrophobic silane surface modification of abrasive grains | SAINT-GOBAIN ABRASIFS (FR) | 2009-10-22 | — | — | US | disclosed |
| WO-2009129384-A2 | HYDROPHILIC AND HYDROPHOBIC SILANE SURFACE MODIFICATION OF ABRASIVE GRAINS | SAINT-GOBAIN ABRASIVES, INC. (US) | 2009-10-22 | — | — | WO | disclosed |