Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.38 |
| ▸ | CA6 | P23280 | 3/20 | 0.38 |
| ▸ | CA7 | P43166 | 3/20 | 0.38 |
| ▸ | CA9 | Q16790 | 3/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.38 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | CA3 | P07451 | 2/20 | 0.36 |
| ▸ | CA4 | P22748 | 2/20 | 0.36 |
| ▸ | CA5A | P35218 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12794863 | 0.92 | CA12 (0.41) | CA12CA6CA7CA9CA14 | |
| SCHEMBL961556 | 0.88 | CA12 (0.41) | CA12CA6CA7CA9CA14 | |
| SCHEMBL5599010 | 0.83 | TSHR (0.42) | ALDH1A1 | |
| SCHEMBL978520 | 0.83 | CA12 (0.38) | CA12CA6CA7CA9CA14 | |
| SCHEMBL12794788 | 0.82 | — | — | |
| SCHEMBL555285 | 0.81 | — | — | |
| SCHEMBL11763967 | 0.81 | CA12 (0.42) | CA12CA6CA7CA9CA14 | |
| SCHEMBL300636 | 0.80 | CA12 (0.39) | CA12CA6CA7CA9CA14 | |
| SCHEMBL12794796 | 0.79 | CA12 (0.44) | CA12CA6CA7CA9CA14 | |
| SCHEMBL37492 | 0.79 | CA12 (0.42) | CA12CA6CA7CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 161 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250223479-A1 | CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD FOR POLISHING TUNGSTEN USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-07-10 | — | — | US | claimed |
| US-20230324267-A1 | DEVICE FOR REDUCING THE VOLUME OF A SAMPLE, A KIT COMPRISING THE SAME, AND USES THEREOF | CHUNG YUAN CHRISTIAN UNIVERSITY (TW) | 2023-10-12 | — | — | US | claimed |
| CN-104144964-B | Epoxy compositions compatible with functional silanes for insulation applications | 陶氏环球技术有限责任公司 | 2016-11-09 | — | — | CN | claimed |
| US-8709959-B2 | Puncture resistant fabric | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2014-04-29 | — | — | US | claimed |
| EP-2010588-B1 | Organosilicon polyurea polymers, elastomers manufactured therefrom and their use | HENKEL AG & CO KGAA (DE) | 2012-01-04 | — | — | EP | claimed |
| CN-1229173-C | Organic silicon anionic surfctant and its synthesis | SHANGHAI SOAP MAKING CO LTD (CN) | 2005-11-30 | — | — | CN | claimed |
| CN-1439452-A | Organic silicon anionic surfctant and its synthesis | SHANGHAI SOAP MAKING CO LTD (CN) | 2003-09-03 | — | — | CN | claimed |
| US-20260139154-A1 | CMP SLURRY COMPOSITION FOR POLISHING PATTERNED TUNGSTEN WAFER AND METHOD OF POLISHING PATTERNED TUNGSTEN WAFER USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2026-05-21 | — | — | US | disclosed |
| EP-4047051-B1 | COMPOSITION FOR ENCAPSULANT FILM COMPRISING ETHYLENE/ALPHA-OLEFIN COPOLYMER AND ENCAPSULANT FILM COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2026-05-20 | — | — | EP | disclosed |
| CN-122070009-A | CMP slurry composition for polishing patterned tungsten wafer and method for polishing patterned tungsten wafer using the same | 三星SDI株式会社 | 2026-05-19 | — | — | CN | disclosed |
| US-12552962-B2 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | disclosed |
| EP-4450549-B1 | ENCAPSULANT FILM COMPOSITION AND ENCAPSULANT FILM COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-12-10 | — | — | EP | disclosed |
| EP-4645499-A1 | SEPARATOR FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-11-05 | — | — | EP | disclosed |
| US-20090143496-A1 | CROSSLINKABLE SILOXANE-UREA COPOLYMERS | WACKER CHEMIE AG (DE) | 2009-06-04 | — | — | US | disclosed |
| US-20080045671-A1 | Cross-Linkable Siloxane Urea Copolymers | WACKER CHEMIE AG (DE) | 2008-02-21 | — | — | US | disclosed |
| US-20070232772-A1 | Crosslinkable Siloxane Urea Copolymers | WACKER CHEMIE AG (DE) | 2007-10-04 | — | — | US | disclosed |
| EP-1784442-A1 | CROSSLINKABLE SILOXANE UREA COPOLYMERS | Wacker Chemie AG (DE) | 2007-05-16 | — | — | EP | disclosed |
| WO-2006021371-A1 | CROSSLINKABLE SILOXANE UREA COPOLYMERS | WACKER CHEMIE AG (DE) | 2006-03-02 | — | — | WO | disclosed |
| CN-1229173-C | Organic silicon anionic surfctant and its synthesis | SHANGHAI SOAP MAKING CO LTD (CN) | 2005-11-30 | — | — | CN | disclosed |
| CN-1439452-A | Organic silicon anionic surfctant and its synthesis | SHANGHAI SOAP MAKING CO LTD (CN) | 2003-09-03 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12552962-B2 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | S1PR2, SGMS2, S1PR1 | CA12 408/4885CA6 3135/4885CA7 1749/4885 |
| US-20090143496-A1 | CROSSLINKABLE SILOXANE-UREA COPOLYMERS | CCNT1, PCNA, RAD1 | CA12 3198/4885CA6 3046/4885CA7 3812/4885 |
| US-20260139154-A1 | CMP SLURRY COMPOSITION FOR POLISHING PATTERNED TUNGSTEN WAFER AND METHOD OF POLISHING PATTERNED TUNGSTEN WAFER USING THE SAME | ZAP70, CMPK1, PRKDC | CA12 442/4885CA6 1923/4885CA7 996/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.