SCHEMBL3010343

SCHEMBL3010343

CCC(CO)(CO)COC(=O)C(C)(S)S

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HIF1A Q16665 1/20 0.37
THRB P10828 1/20 0.32
KDM4E B2RXH2 1/20 0.31
PKM P14618 1/20 0.31
CYP4F2 P78329 2/20 0.30
CYP4A11 Q02928 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3005967 0.90 ALDH1A1 (0.41) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL899906 0.86 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL4186309 0.82 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL1261562 0.81 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL636798 0.81 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL27165259 0.81 ALDH1A1 (0.37) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL13933338 0.79 HIF1A (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL7085097 0.78 MAPK1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL7081957 0.78 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL26548894 0.78 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8951713-B2 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same LG CHEM, LTD. (KR) 2015-02-10 US claimed
US-20130130176-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2013-05-23 US claimed
US-20100196824-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-08-05 US claimed
WO-2009054620-A2 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM. LTD. (KR) 2009-04-30 WO claimed
US-8951713-B2 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same LG CHEM, LTD. (KR) 2015-02-10 US disclosed
US-20130130176-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2013-05-23 US disclosed
US-20100196824-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-08-05 US disclosed
WO-2009054620-A2 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM. LTD. (KR) 2009-04-30 WO disclosed
EP-1548039-B1 PHOTOPOLYMERIZABLE COMPOSITION AND USE THEREOF MITSUI CHEMICALS INC (JP) 2008-08-13 EP disclosed
US-7307107-B2 Photopolymerizable composition and use thereof MITSUI CHEMICALS, INC. (JP) 2007-12-11 US disclosed
US-20060003261-A1 Photopolymerizable composition and use thereof MITSUI CHEMICALS, INC. (JP) 2006-01-05 US disclosed
EP-1548039-A1 PHOTOPOLYMERIZABLE COMPOSITION AND USE THEREOF Mitsui Chemicals, Inc. (JP) 2005-06-29 EP disclosed
US-5767212-A RADICALLY POLYMERIZING ACRYLATE MONOMER CONTAINING SULFUR TORAY INDUSTRIES, INC. (JP) 1998-06-16 US disclosed
EP-0609454-B1 PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER TORAY INDUSTRIES (JP) 1997-10-22 EP disclosed
EP-0609454-A1 PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER TORAY INDUSTRIES, INC. (JP) 1994-08-10 EP disclosed