SCHEMBL3010349

SCHEMBL3010349

CC(S)(S)C(=O)O.CCC(CO)(CO)CO

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.33
TSHR P16473 2/20 0.33
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
HIF1A Q16665 1/20 0.32
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
THRB P10828 1/20 0.30
KMT2A Q03164 1/20 0.30
MAPT P10636 1/20 0.30
PTGS1 P23219 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1171879 0.91 ALDH1A1 (0.33) ALDH1A1TSHRCYP2D6CYP2C19HIF1A
SCHEMBL899908 0.88 MEN1 (0.31) ALDH1A1MEN1CYP1A2THRBKMT2A
SCHEMBL3005971 0.87 TSHR (0.38) ALDH1A1TSHRCYP2D6CYP2C19HIF1A
SCHEMBL27951431 0.86 MEN1 (0.30) ALDH1A1MEN1CYP1A2THRBKMT2A
Pivalate SCHEMBL29249466 0.85 TSHR (0.36) ALDH1A1TSHRCYP2D6CYP2C19HIF1A
Pivalate SCHEMBL27669731 0.85 TSHR (0.36) ALDH1A1TSHRCYP2D6CYP2C19HIF1A
Bicarbonate SCHEMBL31122181 0.82 FFAR3 (0.37) ALDH1A1TSHRHIF1AMEN1CYP1A2
Bicarbonate SCHEMBL1357297 0.82 FFAR3 (0.37) ALDH1A1TSHRHIF1AMEN1CYP1A2
Bicarbonate SCHEMBL30446842 0.82 FFAR3 (0.37) ALDH1A1TSHRHIF1AMEN1CYP1A2
Bicarbonate SCHEMBL8777797 0.82 FFAR3 (0.37) ALDH1A1TSHRHIF1AMEN1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8951713-B2 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same LG CHEM, LTD. (KR) 2015-02-10 US claimed
US-20130130176-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2013-05-23 US claimed
US-20100196824-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-08-05 US claimed
WO-2009054620-A2 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM. LTD. (KR) 2009-04-30 WO claimed
US-8951713-B2 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same LG CHEM, LTD. (KR) 2015-02-10 US disclosed
US-20130130176-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2013-05-23 US disclosed
US-20100196824-A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-08-05 US disclosed
WO-2009054620-A2 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM. LTD. (KR) 2009-04-30 WO disclosed
EP-1548039-B1 PHOTOPOLYMERIZABLE COMPOSITION AND USE THEREOF MITSUI CHEMICALS INC (JP) 2008-08-13 EP disclosed
US-7307107-B2 Photopolymerizable composition and use thereof MITSUI CHEMICALS, INC. (JP) 2007-12-11 US disclosed
US-20060003261-A1 Photopolymerizable composition and use thereof MITSUI CHEMICALS, INC. (JP) 2006-01-05 US disclosed
EP-1548039-A1 PHOTOPOLYMERIZABLE COMPOSITION AND USE THEREOF Mitsui Chemicals, Inc. (JP) 2005-06-29 EP disclosed
US-5767212-A RADICALLY POLYMERIZING ACRYLATE MONOMER CONTAINING SULFUR TORAY INDUSTRIES, INC. (JP) 1998-06-16 US disclosed
EP-0609454-B1 PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER TORAY INDUSTRIES (JP) 1997-10-22 EP disclosed
EP-0609454-A1 PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER TORAY INDUSTRIES, INC. (JP) 1994-08-10 EP disclosed