SCHEMBL301371

SCHEMBL301371

C=CC(=O)OCCC1CO1

nearest known ligand 0.50

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.50
ALDH1A1 P00352 6/20 0.50
TP53 P04637 4/20 0.50
HIF1A Q16665 3/20 0.50
CYP3A4 P08684 3/20 0.50
HSD17B10 Q99714 1/20 0.50
HPGD P15428 1/20 0.46
THRB P10828 2/20 0.39
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MGLL Q99685 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9615813 0.90 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1318703 0.89 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL20505341 0.89 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1355256 0.87 TSHR (0.60) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL8943372 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL353292 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL8982096 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL8943825 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL7707036 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL2143538 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 756 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112241107-B Positive photosensitive resin composition, photosensitive resin film and display device using the same 株式会社东进世美肯 2025-03-11 CN claimed
CN-110967927-B Photosensitive resin composition and display device including the same 三星显示有限公司 2025-01-28 CN claimed
CN-114381156-B Metal oxide dispersion composition, method for producing same, film composition containing same, optical film, and optical element 凯斯科技股份有限公司 2024-03-12 CN claimed
CN-115710438-B Metal oxide dispersion, thin film composition for display, and optical element for display 凯斯科技股份有限公司 2024-01-30 CN claimed
CN-108572516-B Positive photosensitive resin composition, display device and pattern forming method thereof 株式会社东进世美肯 2023-10-17 CN claimed
CN-113121988-B Composite material and foam prepared from same 财团法人工业技术研究院 2023-05-30 CN claimed
CN-116068853-A Photosensitive resin composition and display device 三星显示有限公司 2023-05-05 CN claimed
CN-115710438-A Metal oxide dispersion, thin film composition for display, and optical element for display 凯斯科技股份有限公司 2023-02-24 CN claimed
CN-115710380-A Inorganic particle dispersion liquid with improved transparency and optical element for display 凯斯科技股份有限公司 2023-02-24 CN claimed
EP-3900086-B1 ELECTRODE COMPOSITION FOR A CATHODE OF A CELL OF A LITHIUM-ION BATTERY, A CATHODE SLURRY COMPOSITION, A CATHODE AND THE BATTERY INCORPORATING IT ARLANXEO DEUTSCHLAND GMBH (DE) 2023-01-11 EP claimed
EP-1417272-A2 RADIATION CURABLE POWDER COATING COMPOSITIONS UCB, S.A. (BE) 2004-05-12 EP claimed
EP-1414919-A2 UNSATURATED POWDER COATING COMPOSITIONS UCB, S.A. (BE) 2004-05-06 EP claimed
WO-2003010248-A1 RADIATION CURABLE POWDER COATING COMPOSITIONS UCB, S.A. (BE) 2003-02-06 WO claimed
WO-2003010254-A2 UNSATURATED POWDER COATING COMPOSITIONS UCB, S.A. (BE) 2003-02-06 WO claimed
WO-2003008508-A2 RADIATION CURABLE POWDER COATING COMPOSITIONS UCB, S.A. (BE) 2003-01-30 WO claimed
US-5530036-A STORAGE STABLE THERMOSETTING RESIN COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-25 US claimed
US-5399604-A Thermosetting resin composition comprising /A/ copolymer of unsaturated carboxylic acid or anhydride, unsaturated compound with epoxy group, unsaturated carboxylic acid ester or other vinyl compound, /B/ organic solvent, /C/ silane coupler JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-03-21 US claimed
US-4426439-A Method and apparatus for processing negative photoresist FUJITSU LIMITED (JP) 1984-01-17 US claimed
US-4140606-A Process for preparing a polymerizable (meth) acrylate oligomer SHOWA DENKO K.K. (JP) 1979-02-20 US claimed
US-4049867-A ABRASION RESISTANT, TRANSPARENT JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JA) 1977-09-20 US claimed