Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.73 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.73 |
| ▸ | ESRRG | P62508 | 3/20 | 0.73 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.73 |
| ▸ | AR | P10275 | 1/20 | 0.73 |
| ▸ | HPGD | P15428 | 1/20 | 0.73 |
| ▸ | TSHR | P16473 | 1/20 | 0.73 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.73 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.73 |
| ▸ | HTR6 | P50406 | 1/20 | 0.73 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.73 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.73 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.61 |
| ▸ | MEN1 | O00255 | 1/20 | 0.60 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.60 |
| ▸ | ESRRB | O95718 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | TYR | P14679 | 1/20 | 0.52 |
| ▸ | LTA4H | P09960 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27813218 | 0.90 | ESR1 (0.64) | ESR1ESR2ESRRGCYP3A4AR | |
| SCHEMBL27625133 | 0.87 | ESR1 (0.55) | ESR1ESR2ESRRGCYP3A4AR | |
| Bisphenol A SCHEMBL5291081 | 0.86 | ESR1 (0.73) | ESR1ESR2ESRRGCYP3A4AR | |
| SCHEMBL7942894 | 0.86 | ESR1 (0.73) | ESR1ESR2ESRRGCYP3A4AR | |
| SCHEMBL27813177 | 0.86 | ESR1 (0.63) | ESR1ESR2ESRRGCYP3A4AR | |
| SCHEMBL27645521 | 0.86 | PTGS1 (0.57) | ESR1ESR2ESRRGCYP3A4AR | |
| Bisphenol A SCHEMBL11575663 | 0.86 | ESR1 (0.58) | ESR1ESR2ESRRGCYP3A4AR | |
| SCHEMBL27996 | 0.85 | ESR1 (1.00) | ESR1ESR2ESRRGCYP3A4AR | |
| Bisphenol A SCHEMBL3170263 | 0.85 | ESR1 (1.00) | ESR1ESR2ESRRGCYP3A4AR | |
| Bisphenol A SCHEMBL9774987 | 0.85 | ESR1 (1.00) | ESR1ESR2ESRRGCYP3A4AR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117836927-A | Resin cured film, semiconductor device, and method for manufacturing semiconductor device | 株式会社力森诺科 | 2024-04-05 | — | — | CN | disclosed |
| CN-114207038-B | Resin composition, method for producing cured product, pattern cured product, interlayer insulating film, covercoat, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-117280447-A | Photosensitive resin composition selection method, pattern cured film production method, cured film, semiconductor device, and semiconductor device production method | 株式会社力森诺科 | 2023-12-22 | — | — | CN | disclosed |
| CN-110582726-B | Positive photosensitive resin composition, thermal crosslinking agent for positive photosensitive resin, pattern cured film, method for producing pattern cured film, semiconductor element, and electronic device | 株式会社力森诺科 | 2023-08-04 | — | — | CN | disclosed |
| CN-116194840-A | Photosensitive resin composition, permanent resist, method for forming permanent resist, and method for inspecting cured film for permanent resist | 株式会社力森诺科 | 2023-05-30 | — | — | CN | disclosed |
| CN-115398339-A | Photosensitive resin composition, method for producing patterned cured film, and semiconductor device | 昭和电工材料株式会社 | 2022-11-25 | — | — | CN | disclosed |
| CN-115151868-A | Photosensitive resin composition, method for sorting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device | 昭和电工材料株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-114207038-A | Resin composition, method for producing cured product, patterned cured product, interlayer insulating film, covercoat, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-104823110-B | Photosensitive resin composition, photosensitive film, and method for forming resist pattern | 昭和电工材料株式会社 | 2021-06-04 | — | — | CN | disclosed |
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| CN-101473268-A | Oxime sulfonates and the use therof as latent acids | CIBA HOLDING INC (CH) | 2009-07-01 | — | — | CN | disclosed |
| CN-100475798-C | Sulfonate derivatives and the use therof as latent acids | CIBA SC HOLDING AG (CH) | 2009-04-08 | — | — | CN | disclosed |
| CN-101213169-A | Sulphonium salt initiators | CIBA SC HOLDING AG (CH) | 2008-07-02 | — | — | CN | disclosed |
| CN-100336137-C | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same | JSR CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| CN-1989455-A | Oxime derivatives and the use therof as latent acids | CIBA SC HOLDING AG (CH) | 2007-06-27 | — | — | CN | disclosed |
| CN-1213343-C | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2005-08-03 | — | — | CN | disclosed |
| CN-1628268-A | Sulfonic acid derivatives and their use as latent acids | CIBA SC HOLDING AG (CH) | 2005-06-15 | — | — | CN | disclosed |
| CN-1505820-A | Composition for forming photosensitive dielectric, and decal film, dielectric and electronic component using the same | ������ʱ����ʽ���� | 2004-06-16 | — | — | CN | disclosed |
| CN-1306224-A | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2001-08-01 | — | — | CN | disclosed |
| US-RE37179-E1 | ADDITION POLYMER | JSR CORPORATION (JP) | 2001-05-15 | — | — | US | disclosed |