SCHEMBL30157

SCHEMBL30157

CC(C)(C)c1ccc(I)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.57
TSHR P16473 2/20 0.55
LMNA P02545 1/20 0.52
TYR P14679 1/20 0.52
KIF11 P52732 2/20 0.44
ALDH1A1 P00352 4/20 0.42
HPGD P15428 2/20 0.41
NPC1 O15118 1/20 0.41
MAPT P10636 1/20 0.41
MAPK1 P28482 1/20 0.41
RAB9A P51151 1/20 0.41
HDAC1 Q13547 1/20 0.41
SLC22A2 O15244 1/20 0.41
SLC22A1 O15245 1/20 0.41
SLC22A3 O75751 1/20 0.41
BCHE P06276 3/20 0.40
ACHE P22303 3/20 0.40
ALOX15 P16050 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL2444352 0.97 APP (0.55) APPTSHRLMNATYRKIF11
Ethane SCHEMBL15238205 0.97 APP (0.55) APPTSHRLMNATYRKIF11
Methane SCHEMBL2441578 0.97 APP (0.55) APPTSHRLMNATYRKIF11
Methane SCHEMBL4494379 0.97 APP (0.55) APPTSHRLMNATYRKIF11
SCHEMBL10304854 0.92 KIF11 (0.56) APPTSHRLMNATYRKIF11
SCHEMBL2436188 0.92 APP (0.52) APPTSHRLMNATYRKIF11
SCHEMBL15238196 0.89 APP (0.50) APPTSHRLMNATYRKIF11
SCHEMBL2438938 0.89 APP (0.50) APPTSHRLMNATYRKIF11
Tert-Butylbenzene SCHEMBL5188608 0.89 APP (0.50) APPTSHRLMNATYRKIF11
Acetic Acid SCHEMBL3745418 0.85 SRD5A2 (0.50) APPTSHRLMNATYRKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2275 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121574043-A Preparation method of bis (4-tert-butylphenyl) iodohexafluorophosphate 中国船舶集团有限公司第七一八研究所 2026-02-27 CN claimed
CN-119977871-A 1, 2-Dibromo-6-tert-butyl-9- (4-tert-butylphenyl) -9H-carbazole and synthesis method thereof 南京理工大学 2025-05-13 CN claimed
CN-118496629-B Preparation method of high-viscosity epoxide polymerization product 南京威尔药业科技有限公司 2025-04-29 CN claimed
CN-117362311-B Foscoline tetracyclic analogue and preparation method thereof 南通大学 2025-04-04 CN claimed
CN-117586274-B Forskolin ring-expanding derivative and preparation method and application thereof 南通大学附属医院 2025-04-01 CN claimed
WO-2025030778-A1 STAR-LIKE MICROMOLECULAR CROSS-LINKED HOLE TRANSPORT MATERIAL, AND PREPARATION METHOD THEREFOR AND USE THEREOF 天津大学 2025-02-13 WO claimed
CN-117362310-B Forskolin oxygen bridged ring derivative and preparation method thereof 南通大学 2024-12-06 CN claimed
CN-116178092-B Preparation method of 1, 4-tetraphenyl-1, 3-butadiene and derivatives thereof 苏州大学 2024-11-22 CN claimed
CN-118978510-A Preparation method, product and application of polydentate organic ligand and transition metal coordination polymer thereof 吉林大学 2024-11-19 CN claimed
CN-118496629-A Preparation method of high-viscosity epoxide polymerization product 南京威尔药业科技有限公司 2024-08-16 CN claimed
CN-101288027-A Low activation energy dissolution modification agents for photoresist applications IBM (US) 2008-10-15 CN claimed
EP-1963344-A1 ORGANOPHOSPHORIC DERIVATIVES USEFUL AS ANTI-PARASITIC AGENTS UNIVERSITEIT GENT (BE) 2008-09-03 EP claimed
CN-101218225-A Photoactive compounds AZ ELECTRONIC MATERIALS USA (US) 2008-07-09 CN claimed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 WO claimed
WO-2007071453-A1 ORGANOPHOSPHORIC DERIVATIVES USEFUL AS ANTI-PARASITIC AGENTS UNIVERSITEIT GENT (BE) 2007-06-28 WO claimed
CN-1846169-A Negative resist composition with fluorosulfonamide-containing polymer IBM (US) 2006-10-11 CN claimed
CN-1782876-A Fluorinated photoresist materials with improved etch resistant properties IBM (US) 2006-06-07 CN claimed
CN-1637603-A Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use IBM (US) 2005-07-13 CN claimed
CN-1615458-A Negative deep ultraviolet photoresist CLARIANT FINANCE BVI LTD (VG) 2005-05-11 CN claimed
US-5498765-A Positive photoresist composition containing photoacid generator and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-03-12 US claimed