SCHEMBL30163583

SCHEMBL30163583

O=C(OCl)c1cccc2cc3ccccc3cc12

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.61
ALDH1A1 P00352 6/20 0.61
GAA P10253 3/20 0.61
MAPT P10636 3/20 0.42
TDP1 Q9NUW8 1/20 0.42
KMT2A Q03164 4/20 0.41
POLB P06746 1/20 0.41
HPGD P15428 4/20 0.40
MEN1 O00255 3/20 0.40
NR4A1 P22736 1/20 0.40
NR4A2 P43354 1/20 0.40
NR4A3 Q92570 1/20 0.40
CYP1A2 P05177 1/20 0.40
GLA P06280 1/20 0.40
CYP2C19 P33261 1/20 0.40
HSD17B10 Q99714 1/20 0.40
MTNR1A P48039 1/20 0.39
PTPN1 P18031 1/20 0.39
CDC25B P30305 2/20 0.38
IDO1 P14902 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2464246 0.84 KDM4E (0.68) KDM4EALDH1A1GAAMAPTTDP1
SCHEMBL5240592 0.83 NR4A1 (0.59) KDM4EALDH1A1GAAMAPTKMT2A
SCHEMBL1164706 0.82 ALDH1A1 (0.61) KDM4EALDH1A1GAAMAPTKMT2A
SCHEMBL25189907 0.81 ALDH1A1 (0.59) KDM4EALDH1A1GAAMAPTKMT2A
SCHEMBL28720960 0.81 MAPT (0.67) KDM4EALDH1A1GAAMAPTTDP1
SCHEMBL29520979 0.79 ALDH1A1 (0.67) KDM4EALDH1A1GAAMAPTTDP1
SCHEMBL1327792 0.79 ALDH1A1 (0.67) KDM4EALDH1A1GAAMAPTTDP1
SCHEMBL28358916 0.79 ALDH1A1 (0.62) KDM4EALDH1A1GAAMAPTTDP1
SCHEMBL578683 0.79 KDM4E (0.71) KDM4EALDH1A1GAAMAPTTDP1
SCHEMBL1204440 0.78 KDM4E (0.56) KDM4EALDH1A1GAAMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115677939-A Photosensitive graft polymer and photosensitive resin composition containing same 茂名清荷科技有限公司 2023-02-03 CN disclosed