⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL17273280 | 0.89 | — | — | |
| SCHEMBL3018813 | 0.87 | — | — | |
| Sulfuric Acid SCHEMBL28010101 | 0.87 | — | — | |
| Trifluoroacetic Acid SCHEMBL3012027 | 0.83 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2679735 | 0.82 | ACHE (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL28982042 | 0.81 | — | — | |
| SCHEMBL3012130 | 0.81 | — | — | |
| Iodide SCHEMBL3014010 | 0.79 | — | — | |
| Water SCHEMBL28967095 | 0.79 | — | — | |
| Bromide SCHEMBL3006965 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112086564-A | Passivating agent and passivation method thereof and method for preparing semiconductor film | 杭州纤纳光电科技有限公司 | 2020-12-15 | — | — | CN | disclosed |
| US-8362095-B2 | Defoaming of ionic liquids | EVONIK GOLDSCHMIDT GMBH (DE) | 2013-01-29 | — | — | US | disclosed |
| US-20100192814-A1 | PROCESS FOR PRODUCING ANTISTATICALLY TREATED ARTIFICIAL STONE FOR FLAT STRUCTURES | EVONIK GOLDSCHMIDT GMBH (DE) | 2010-08-05 | — | — | US | disclosed |
| US-20100084597-A1 | DEFOAMING OF IONIC LIQUIDS | EVONIK DEGUSSA GMBH (DE) | 2010-04-08 | — | — | US | disclosed |
| US-20100029519-A1 | PERFORMANCE ADDITIVES FOR IMPROVING THE WETTING PROPERTIES OF IONIC LIQUIDS ON SOLID SURFACES | EVONIK DEGUSSA GMBH (DE) | 2010-02-04 | — | — | US | disclosed |