SCHEMBL3019700

SCHEMBL3019700

O=C(NCO)C(=O)NCO

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
EGLN1 Q9GZT9 2/20 0.39
TET2 Q6N021 1/20 0.39
ALDH1A1 P00352 2/20 0.32
LDHA P00338 1/20 0.31
SRR Q9GZT4 1/20 0.31
PLA2G2A P14555 1/20 0.31
MEN1 O00255 1/20 0.30
USP2 O75604 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11300324 0.79
SCHEMBL9999987 0.77 EGLN1 (0.62) EGLN1TET2ALDH1A1LDHASRR
SCHEMBL540931 0.77 TET2 (0.32) EGLN1TET2
SCHEMBL9231136 0.77 EGLN1 (0.37) EGLN1TET2LDHASRRPLA2G2A
SCHEMBL18694667 0.75 EPHX1 (0.35) ALDH1A1LDHASRRMEN1USP2
SCHEMBL27834 0.75
SCHEMBL7106687 0.75
SCHEMBL2760574 0.75
SCHEMBL8443410 0.75
SCHEMBL27050 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0593936-A1 N-[2-hydroxy-3-(2H-benzotriazol-2-yl)benzyl]oxamides as light stabilisers ELF ATOCHEM NORTH AMERICA, INC. (US) 1994-04-27 EP claimed
US-4438189-A POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1984-03-20 US claimed
US-20100183978-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT FUJIFILM CORPORATION (JP) 2010-07-22 US disclosed
US-20100183978-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT FUJIFILM CORPORATION (JP) 2010-07-22 US disclosed
US-20100178484-A1 TRANSPARENT POLYMER ARTICLES OF LOW THICKNESS LEPPARD DAVID GEORGE 2010-07-15 US disclosed
US-20090292038-A1 Flame Retardant Photoimagable Coverlay Compositions and Methods Relating thereto E. I. DU PONT DE NEMOURS AND COMPANY 2009-11-26 US disclosed
US-7618766-B2 Flame retardant photoimagable coverlay compositions and methods relating thereto E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-11-17 US disclosed
US-7527915-B2 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-05-05 US disclosed
US-20080033090-A1 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2008-02-07 US disclosed
WO-2007073498-A2 FLAME RETARDANT PHOTOIMAGABLE COVERLAY COMPOSITIONS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-06-28 WO disclosed
US-20070149635-A1 Flame retardant photoimagable coverlay compositions and methods relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2007-06-28 US disclosed
EP-0628180-A1 PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1994-12-14 EP disclosed
EP-0593936-A1 N-[2-hydroxy-3-(2H-benzotriazol-2-yl)benzyl]oxamides as light stabilisers ELF ATOCHEM NORTH AMERICA, INC. (US) 1994-04-27 EP disclosed
EP-0573609-A1 PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-12-15 EP disclosed
WO-1993017368-A1 PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-09-02 WO disclosed
WO-1992015628-A1 PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-17 WO disclosed
EP-0501433-A1 Solvent dispersible interpenetrating polymer networks E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-02 EP disclosed
EP-0073444-B1 RADIATION-POLYMERISABLE COMPOSITION AND COPYING MATERIAL MADE THEREFROM HOECHST AKTIENGESELLSCHAFT (DE) 1986-03-05 EP disclosed
US-4438189-A POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1984-03-20 US disclosed
EP-0073444-A2 Radiation-polymerisable composition and copying material made therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1983-03-09 EP disclosed