Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.68 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.68 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.58 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 5/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | IDH1 | O75874 | 2/20 | 0.44 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | BCL2 | P10415 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28298946 | 0.89 | ESR1 (0.63) | ESR1ESR2KEAP1HSPA5MAPT | |
| SCHEMBL19016860 | 0.87 | ESR1 (0.66) | ESR1ESR2KEAP1MAPTMEN1 | |
| SCHEMBL29133191 | 0.84 | ESR1 (0.61) | ESR1ESR2KEAP1MAPTMEN1 | |
| SCHEMBL922815 | 0.84 | ESR1 (0.66) | ESR1ESR2MAPTALDH1A1HTT | |
| SCHEMBL27699069 | 0.84 | ESR1 (0.55) | ESR1ESR2KEAP1HSPA5MAPT | |
| SCHEMBL4065746 | 0.83 | HSPA5 (0.56) | ESR1ESR2KEAP1HSPA5MAPT | |
| SCHEMBL18287640 | 0.83 | ESR1 (0.59) | ESR1ESR2KEAP1MAPTMEN1 | |
| SCHEMBL28651474 | 0.82 | MAPT (0.64) | KEAP1HSPA5MAPTMEN1KMT2A | |
| SCHEMBL14708688 | 0.82 | HSPA5 (0.67) | ESR1ESR2KEAP1HSPA5MAPT | |
| SCHEMBL10049007 | 0.82 | HSPA5 (0.67) | ESR1ESR2KEAP1HSPA5MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113646052-B | Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument | 百乐墨水株式会社 | 2024-05-17 | — | — | CN | disclosed |
| CN-113646052-A | Reversible thermal discoloration composition, reversible thermal discoloration microcapsule pigment encapsulating the reversible thermal discoloration composition, and writing instrument using the reversible thermal discoloration microcapsule pigment | 百乐墨水株式会社 | 2021-11-12 | — | — | CN | disclosed |
| CN-109748780-B | Synthetic method of tetrapolybenzyl compounds | 中国医学科学院药物研究所 | 2021-09-14 | — | — | CN | disclosed |
| WO-2020209118-A1 | REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME | 株式会社パイロットコーポレーション | 2020-10-15 | — | — | WO | disclosed |
| WO-2020203603-A1 | REVERSIBLE THERMOCHROMIC COMPOSITION, REVERSIBLE THERMOCHROMIC MICROCAPSULE PIGMENT COMPRISING SAME, AND WRITING INSTRUMENT USING SAME | パイロットインキ株式会社 | 2020-10-08 | — | — | WO | disclosed |
| CN-104423170-B | Photosensitive polysiloxane composition, protective film and assembly with protective film | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-104345567-B | photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2019-04-02 | — | — | CN | disclosed |
| US-10185237-B2 | Electrophotographic photoreceptor, electrophotographic photoreceptor cartridge, image forming apparatus, and polyarylate resin | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-01-22 | — | — | US | disclosed |
| US-10185237-B2 | Electrophotographic photoreceptor, electrophotographic photoreceptor cartridge, image forming apparatus, and polyarylate resin | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-01-22 | — | — | US | disclosed |
| CN-107561863-A | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2018-01-09 | — | — | CN | disclosed |
| CN-1609708-A | Positive type photoresist composition for manufacturing system LCD, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2005-04-27 | — | — | CN | disclosed |
| CN-1573544-A | Plus photoresist composition for manufacturing system LCD and method for making resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2005-02-02 | — | — | CN | disclosed |
| CN-1550898-A | Positive anticorrosive additive composition and anticorrosive pattern forming method | 东京应化工业株式会社 | 2004-12-01 | — | — | CN | disclosed |
| CN-1519648-A | Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern | 东京应化工业株式会社 | 2004-08-11 | — | — | CN | disclosed |
| CN-1507582-A | Resist remover composition | ����ɪ��٩��ʽ���� | 2004-06-23 | — | — | CN | disclosed |
| CN-1488664-A | Vibration damping material composition | 株式会社泰特克斯 | 2004-04-14 | — | — | CN | disclosed |
| CN-1484095-A | Positive photoresist composition and method for forming slushing pattern | 东京应化工业株式会社 | 2004-03-24 | — | — | CN | disclosed |
| CN-1469197-A | Positive photoresist composition and method for forming resist pattern | 东京应化工业株式会社 | 2004-01-21 | — | — | CN | disclosed |
| CN-1469199-A | Positive photoresist composition and method for forming etch resistant pattern | 东京应化工业株式会社 | 2004-01-21 | — | — | CN | disclosed |
| CN-1453639-A | Novolac resin solution photoresist composition and its preparing method | TOKYO IND CO LTD (JP) | 2003-11-05 | — | — | CN | disclosed |