SCHEMBL4065746

SCHEMBL4065746

Cc1cc(Cc2ccccc2O)cc(C)c1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSPA5 P11021 1/20 0.56
KEAP1 Q14145 1/20 0.55
SHBG P04278 1/20 0.48
MAPT P10636 4/20 0.46
ALDH1A1 P00352 2/20 0.46
MEN1 O00255 1/20 0.46
HTT P42858 1/20 0.46
KMT2A Q03164 1/20 0.46
IDH1 O75874 1/20 0.44
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
BCL2 P10415 1/20 0.44
BCL2L1 Q07817 1/20 0.44
TP53 P04637 1/20 0.44
GAA P10253 1/20 0.44
MAPK1 P28482 1/20 0.44
HSD17B10 Q99714 1/20 0.44
TRPA1 O75762 1/20 0.43
ALK Q9UM73 1/20 0.43
ALOX5 P09917 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8740881 0.91 HSPA5 (0.55) HSPA5KEAP1SHBGMAPTALDH1A1
SCHEMBL29290546 0.87 SHBG (0.58) HSPA5KEAP1SHBGMAPTALDH1A1
SCHEMBL30374688 0.87 SHBG (0.58) HSPA5KEAP1SHBGMAPTALDH1A1
SCHEMBL13609064 0.84 ALDH1A1 (0.52) SHBGALDH1A1ESR1ESR2GAA
SCHEMBL10339590 0.83 HSPA5 (0.71) HSPA5KEAP1MEN1KMT2ABCL2
SCHEMBL3025005 0.83 ESR1 (0.68) HSPA5KEAP1MAPTALDH1A1MEN1
SCHEMBL27950266 0.82 HSPA5 (0.58) HSPA5KEAP1MAPTALDH1A1MEN1
SCHEMBL5406194 0.82 ALDH1A1 (0.56) SHBGALDH1A1ESR1ESR2TRPA1
SCHEMBL13588059 0.82 KEAP1 (0.49) HSPA5KEAP1MAPTALDH1A1MEN1
SCHEMBL8679900 0.82 ELANE (0.42) HSPA5KEAP1SHBGMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1278185-C Positive photoresist composition and method for forming etch resistant pattern TOKYO APPLIED CHEMICAL INDUSTR (JP) 2006-10-04 CN claimed
CN-1469199-A Positive photoresist composition and method for forming etch resistant pattern 东京应化工业株式会社 2004-01-21 CN claimed
US-5238775-A Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-24 US claimed
CN-113646052-B Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument 百乐墨水株式会社 2024-05-17 CN disclosed
CN-113646052-A Reversible thermal discoloration composition, reversible thermal discoloration microcapsule pigment encapsulating the reversible thermal discoloration composition, and writing instrument using the reversible thermal discoloration microcapsule pigment 百乐墨水株式会社 2021-11-12 CN disclosed
WO-2020209118-A1 REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME 株式会社パイロットコーポレーション 2020-10-15 WO disclosed
WO-2020203603-A1 REVERSIBLE THERMOCHROMIC COMPOSITION, REVERSIBLE THERMOCHROMIC MICROCAPSULE PIGMENT COMPRISING SAME, AND WRITING INSTRUMENT USING SAME パイロットインキ株式会社 2020-10-08 WO disclosed
CN-103885294-B Photosensitive polysiloxane composition, protective film and element with protective film 奇美实业股份有限公司 2017-07-14 CN disclosed
CN-103885289-B Photosensitive resin composition, color filter and liquid crystal display element thereof 奇美实业股份有限公司 2017-01-04 CN disclosed
CN-103424990-B Photosensitive polysiloxane composition, protective film and element with protective film 奇美实业股份有限公司 2016-08-10 CN disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
CN-1118003-C Photoresist scavenger composition TONGJIN CHEMICALS INDUSTRY CO (KR) 2003-08-13 CN disclosed
WO-2002095500-A1 RESIST REMOVER COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2002-11-28 WO disclosed
US-6140027-A WATER SOLUBLE AMINE, POLAR ORGANIC SOLVENT, TRIAZOLE COMPOUND AND SILICONE SURFACTANT DONGJIN SEMICHEM CO., LTD. (KR) 2000-10-31 US disclosed
CN-1258730-A Photoresist scavenger composition TONGJIN CHEMICALS INDUSTRY CO (KR) 2000-07-05 CN disclosed
US-6013407-A PHOTORESISTS WITH PHENOLIC RESINS, QUINONEDIAZIDE SULFONATES, PHOTOSENSITIVE AGENTS AND PHENOLIC COMPOUNDS NIPPON ZEON CO., LTD. (JP) 2000-01-11 US disclosed
EP-0831370-A1 POSITIVE RESIST COMPOSITION NIPPON ZEON CO., LTD. (JP) 1998-03-25 EP disclosed
US-5238775-A Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM HSPA5 4266/4885KEAP1 1098/4885SHBG 3960/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.