Methacrylic Acid

Methacrylic Acid

SCHEMBL3025698

C=C(C)C(=O)O.C=CC(OC)OC

nearest known ligand 0.37

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Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
TDP1 Q9NUW8 1/20 0.31
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2203797 0.78 ALDH1A1 (0.44) ALDH1A1TSHR
Urea SCHEMBL28964422 0.78 ALDH1A1 (0.36) ALDH1A1TDP1TSHR
Methacrylic Acid SCHEMBL29653741 0.77 ALDH1A1 (0.44) ALDH1A1TDP1TSHR
Methacrylic Acid SCHEMBL539234 0.77
SCHEMBL243362 0.77
Methacrylic Acid SCHEMBL2849152 0.75 ALDH1A1 (0.43) ALDH1A1TDP1TSHR
Methacrylic Acid SCHEMBL8005854 0.75 ALDH1A1 (0.43) ALDH1A1TDP1TSHR
SCHEMBL19029436 0.74
SCHEMBL4635370 0.74
Methacrylic Acid SCHEMBL23699842 0.74 ALDH1A1 (0.53) ALDH1A1TDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7749680-B2 Photoresist composition and method for forming pattern of a semiconductor device HYNIX SEMICONDUCTOR INC. (KR) 2010-07-06 US disclosed
US-20080166638-A1 Photoresist Composition And Method For Forming Pattern Of A Semiconductor Device HYNIX SEMICONDUCTOR INC. (KR) 2008-07-10 US disclosed