⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL130563 | 0.70 | — | — | |
| SCHEMBL11096454 | 0.67 | — | — | |
| SCHEMBL8115593 | 0.65 | — | — | |
| Glyoxylate SCHEMBL11690306 | 0.63 | TSHR (0.50) | — | |
| Glyoxylate SCHEMBL1518069 | 0.63 | TSHR (0.50) | — | |
| SCHEMBL29713 | 0.63 | — | — | |
| Glyoxylate SCHEMBL15868 | 0.63 | — | — | |
| SCHEMBL278814 | 0.63 | — | — | |
| SCHEMBL130558 | 0.63 | — | — | |
| Glyoxylate SCHEMBL25410023 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1970760-B1 | Positive resist composition containing a resin for hydrophobilizing resist surface, method for production thereof | FUJIFILM CORP (JP) | 2012-12-26 | — | — | EP | claimed |
| EP-1970760-B1 | Positive resist composition containing a resin for hydrophobilizing resist surface, method for production thereof | FUJIFILM CORP (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-20100203445-A1 | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| JP-2009237378-A | NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME | FUJIFILM CORP | 2009-10-15 | — | — | JP | disclosed |
| JP-2009192935-A | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP | 2009-08-27 | — | — | JP | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20070108894-A1 | Organic electroluminescent device | IDEMITSU KOSAN CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| WO-2004005280-A1 | NOVEL QUINOLINIC COMPOUNDS SHOWING A FEATURE OF EXCITED-STATE INTRAMOLECULAR PROTON TRANSFER (ESIPT) | DONGWOO FINE-CHEM CO., LTD. (KR) | 2004-01-15 | — | — | WO | disclosed |
| US-6280897-B1 | GENERATION OF ACID WITH ACTINIC RADIATION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-08-28 | — | — | US | disclosed |
| US-6045968-A | COMPRISING AN ACID-DECOMPOSABLE NOVOLAK RESIN, AN ALKALI-SOLUBLE RESIN AND A PHOTO-ACID GENERATING AGENT; HIGH ALKALI SOLUBILITY, HIGH RESOLUTION, AND HIGH REPRODUCIBILITY | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-04 | — | — | US | disclosed |
| US-5932391-A | CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5863699-A | FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-01-26 | — | — | US | disclosed |
| US-5837419-A | ACID DECOMPOSABLE RESIN, PHOTO-ACID GENERATING AGENT AND NAPHTHOL NOVOLAK | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-11-17 | — | — | US | disclosed |
| EP-0227600-A1 | Process for sizing paper with anionic hydrophobic sizing agents and polymerized monoallylic amines as retention agents | CIBA-GEIGY AG (CH) | 1987-07-01 | — | — | EP | disclosed |
| US-3869401-A | STABILIZED ACIDIC HYDROGEN PEROXIDE SOLUTIONS | DU PONT | 1975-03-04 | — | — | US | disclosed |