⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2283367 | 0.97 | GAA (0.36) | — | |
| SCHEMBL2284493 | 0.97 | GAA (0.36) | — | |
| SCHEMBL28554252 | 0.97 | GAA (0.36) | — | |
| SCHEMBL2286776 | 0.97 | GAA (0.36) | — | |
| SCHEMBL303934 | 0.97 | — | — | |
| SCHEMBL2285364 | 0.97 | GAA (0.36) | — | |
| SCHEMBL2280925 | 0.97 | GAA (0.36) | — | |
| SCHEMBL2281635 | 0.97 | GAA (0.36) | — | |
| SCHEMBL2285393 | 0.97 | GAA (0.36) | — | |
| Ethylene SCHEMBL27540279 | 0.95 | GAA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1531 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-210200440-U | PTC over-current protection device capable of effectively improving long-term environmental stability | CYG WAYON CIRCUIT PROTECTION CO., LTD. | 2020-03-27 | — | — | CN | claimed |
| CN-110769818-A | Use of coenzyme Q10 preparation for treating and preventing epidermolysis bullosa | 博格有限责任公司 | 2020-02-07 | — | — | CN | claimed |
| CN-107418156-B | A kind of high glow-wire enhancing flame retardant type PBT composite and preparation method thereof | 金旸（厦门）新材料科技有限公司 | 2019-12-03 | — | — | CN | claimed |
| CN-110267728-A | Adsorbent device | 卡尔冈碳素公司 | 2019-09-20 | — | — | CN | claimed |
| CN-110249018-A | Vibration damping silicone adhesive substance | 德莎欧洲股份公司 | 2019-09-17 | — | — | CN | claimed |
| CN-110225951-A | Vibration damping silicone adhesive substance | 德莎欧洲股份公司 | 2019-09-10 | — | — | CN | claimed |
| CN-109153843-B | Polybutylene terephthalate resin composition and molded article | 三菱工程塑料株式会社 | 2019-08-30 | — | — | CN | claimed |
| CN-110191934-A | Vibration damping silicone adhesive substance | 德莎欧洲股份公司 | 2019-08-30 | — | — | CN | claimed |
| CN-110138259-A | A kind of resistance to high humidity flexible wearable friction nanometer power generator and its preparation method and application | 中国科学院兰州化学物理研究所 | 2019-08-16 | — | — | CN | claimed |
| CN-110111959-A | A kind of PTC over-current protection device effectively improving long-range circumstances stability | 上海长园维安电子线路保护有限公司 | 2019-08-09 | — | — | CN | claimed |
| US-7994273-B2 | Photoactive materials | ROLIC AG (CH) | 2011-08-09 | — | — | US | claimed |
| WO-2011014520-A2 | COMPOUNDS AND COMPOSITIONS AS MODULATORS OF GPR119 ACTIVITY | IRM LLC (BM) | 2011-02-03 | — | — | WO | claimed |
| US-7750185-B2 | Photoactive materials | ROLIC AG (CH) | 2010-07-06 | — | — | US | claimed |
| EP-1150166-B1 | Polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-12-19 | — | — | EP | claimed |
| US-20050288480-A1 | Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked | ROLIC AG (CH) | 2005-12-29 | — | — | US | claimed |
| EP-1386910-A1 | Photoactive materials | Rolic AG (CH) | 2004-02-04 | — | — | EP | claimed |
| US-6667145-B1 | Resist composition comprising as a base resin a polymer having highly adherent, highly rigid units and especially suited as micropatterning material for VLSI fabrication, and (2) a patterning process using the resist | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-23 | — | — | US | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| US-6566038-B2 | Micropatterning using electron beams or ultraviolet rays | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-20 | — | — | US | claimed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |