SCHEMBL302919

SCHEMBL302919

C=C(C)C(=O)OCC(CCCC)(CCCC)OP(=O)(OC(CCCC)(CCCC)COC(=O)C(=C)C)OC(CCCC)(CCCC)COC(=O)C(=C)C

nearest known ligand 0.46

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
THRB P10828 1/20 0.37
ALDH1A1 P00352 2/20 0.35
SMPD1 P17405 3/20 0.32
FDPS P14324 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1191214 0.94 TSHR (0.51) TSHRTHRBSMPD1FDPS
SCHEMBL302921 0.90 TSHR (0.45) TSHRTHRBALDH1A1SMPD1FDPS
SCHEMBL1191216 0.84 TSHR (0.50) TSHRSMPD1FDPS
SCHEMBL15752920 0.84 THRB (0.41) TSHRTHRBALDH1A1
SCHEMBL26107155 0.80 TSHR (0.40) TSHRTHRBALDH1A1SMPD1FDPS
SCHEMBL15752870 0.80 TSHR (0.39) TSHRTHRBALDH1A1
SCHEMBL128679 0.79 TSHR (0.49) TSHRTHRBALDH1A1SMPD1FDPS
SCHEMBL8850908 0.77 TSHR (0.55) TSHRTHRBALDH1A1
SCHEMBL9186435 0.77 TSHR (0.55) TSHRTHRBALDH1A1
SCHEMBL8626664 0.77 SMPD1 (0.33) SMPD1FDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12347862-B2 Anode slurry composition LG ENERGY SOLUTION, LTD. (KR) 2025-07-01 US claimed
CN-119192495-A Organosilicon modified emulsifier and preparation method and application thereof 广州市斯洛柯新材料股份有限公司 2024-12-27 CN claimed
CN-111801824-B Negative electrode slurry composition 株式会社LG新能源 2023-08-04 CN claimed
EP-3739677-B1 ANODE SLURRY COMPOSITION LG ENERGY SOLUTION LTD (KR) 2022-06-01 EP claimed
US-20200403242-A1 ANODE SLURRY COMPOSITION LG CHEM, LTD. (KR) 2020-12-24 US claimed
EP-3739677-A1 ANODE SLURRY COMPOSITION LG CHEM, LTD. (KR) 2020-11-18 EP claimed
CN-111801824-A Negative electrode paste composition 株式会社LG化学 2020-10-20 CN claimed
EP-4119618-B1 ALUMINUM PIGMENT WITH ADHERENT RESINOUS COMPOUND AND PRODUCTION METHOD THEREFOR ASAHI CHEMICAL IND (JP) 2026-03-25 EP disclosed
US-12347862-B2 Anode slurry composition LG ENERGY SOLUTION, LTD. (KR) 2025-07-01 US disclosed
WO-2025041705-A1 COATING FILM HAVING MATTE LAYER 旭化成株式会社 2025-02-27 WO disclosed
WO-2025018282-A1 AQUEOUS COMPOSITION FOR POSITIVE ELECTRODE OF LITHIUM ION SECONDARY BATTERY, POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, AND LITHIUM ION SECONDARY BATTERY 旭化成株式会社 2025-01-23 WO disclosed
CN-119192495-A Organosilicon modified emulsifier and preparation method and application thereof 广州市斯洛柯新材料股份有限公司 2024-12-27 CN disclosed
CN-119019868-A Resin-attached aluminum pigment, paint and ink 旭化成株式会社 2024-11-26 CN disclosed
EP-0376318-B1 Thermosensitive recording member KAO CORP (JP) 1994-03-09 EP disclosed
US-5091356-A Comprising a substrate, a foamed dispersion layer of a self-emulsifiable resin, and a thermosensitive coloring layer containing a developer; stability; colorfastness; intensity KAO CORPORATION (JP) 1992-02-25 US disclosed
EP-0280749-B1 A NOVEL RESIN-COATED METALLIC PIGMENT, A PROCESS FOR ITS PRODUCTION AND ITS USE ASAHI KASEI METALS LIMITED (JP) 1991-07-03 EP disclosed
US-4988663-A HEAT SENSITIVE RECORDING PAPER FOR COMPUTERS, MULTILAYER COATINGS OF POLYMERS, COLORING KAO CORPORATION (JP) 1991-01-29 US disclosed
EP-0304936-A2 Heat sensitive paper Kao Corporation (JP) 1989-03-01 EP disclosed
EP-0280749-A1 A novel resin-coated metallic pigment, a process for its production and its use ASAHI KASEI METALS LIMITED (JP) 1988-09-07 EP disclosed
US-4750940-A ETHYLENICALLY UNSATURATED CARBOXYLIC ACID ESTER AND PHOSPHORIC MONO- OR DI ESTER WITH ETHYLENICALLY DOUBLE BONDS ASAHI KASEI METALS LIMITED (JP) 1988-06-14 US disclosed