SCHEMBL302920

SCHEMBL302920

C=C(C)C(=O)OC(CCCC)(CCCC)COP(=O)(O)O

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
LPAR3 Q9UBY5 5/20 0.38
LPAR1 Q92633 3/20 0.38
LPAR2 Q9HBW0 3/20 0.38
S1PR1 P21453 4/20 0.35
S1PR3 Q99500 4/20 0.35
S1PR4 O95977 3/20 0.34
S1PR5 Q9H228 3/20 0.34
S1PR2 O95136 2/20 0.34
SMPD1 P17405 3/20 0.34
FDPS P14324 1/20 0.34
ENPP2 Q13822 2/20 0.34
LPAR6 P43657 1/20 0.34
LPAR4 Q99677 1/20 0.34
LPAR5 Q9H1C0 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL303490 0.94 TSHR (0.43) TSHRLPAR3LPAR1LPAR2S1PR1
SCHEMBL26107150 0.91 TSHR (0.33) TSHRLPAR3LPAR1LPAR2S1PR1
SCHEMBL3075136 0.86 ALDH1A1 (0.33) TSHRLPAR3LPAR1LPAR2
SCHEMBL1805860 0.82 TSHR (0.40) TSHRLPAR3LPAR2SMPD1FDPS
SCHEMBL4879478 0.81 TSHR (0.41) TSHRLPAR3LPAR1LPAR2S1PR1
SCHEMBL15752874 0.80 CYP3A4 (0.38) TSHRLPAR3LPAR1LPAR2ENPP2
SCHEMBL13260039 0.80 TSHR (0.43) TSHR
SCHEMBL128680 0.79 TSHR (0.40) TSHRLPAR3LPAR1LPAR2S1PR1
SCHEMBL3853129 0.78 TSHR (0.49) TSHRSMPD1
SCHEMBL799000 0.77 TSHR (0.52) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12347862-B2 Anode slurry composition LG ENERGY SOLUTION, LTD. (KR) 2025-07-01 US claimed
CN-119192495-A Organosilicon modified emulsifier and preparation method and application thereof 广州市斯洛柯新材料股份有限公司 2024-12-27 CN claimed
CN-118308049-A Water-based polyurethane binder, preparation method thereof and application thereof in new energy battery 安徽大学绿色产业创新研究院 2024-07-09 CN claimed
CN-111801824-B Negative electrode slurry composition 株式会社LG新能源 2023-08-04 CN claimed
EP-3739677-B1 ANODE SLURRY COMPOSITION LG ENERGY SOLUTION LTD (KR) 2022-06-01 EP claimed
US-20200403242-A1 ANODE SLURRY COMPOSITION LG CHEM, LTD. (KR) 2020-12-24 US claimed
EP-3739677-A1 ANODE SLURRY COMPOSITION LG CHEM, LTD. (KR) 2020-11-18 EP claimed
CN-111801824-A Negative electrode paste composition 株式会社LG化学 2020-10-20 CN claimed
CN-111129457-A Aqueous ternary cathode slurry and preparation method thereof 名添科技(深圳)有限公司 2020-05-08 CN claimed
JP-61023652-A None JP disclosed
EP-4119618-B1 ALUMINUM PIGMENT WITH ADHERENT RESINOUS COMPOUND AND PRODUCTION METHOD THEREFOR ASAHI CHEMICAL IND (JP) 2026-03-25 EP disclosed
US-12347862-B2 Anode slurry composition LG ENERGY SOLUTION, LTD. (KR) 2025-07-01 US disclosed
WO-2025041705-A1 COATING FILM HAVING MATTE LAYER 旭化成株式会社 2025-02-27 WO disclosed
WO-2025018282-A1 AQUEOUS COMPOSITION FOR POSITIVE ELECTRODE OF LITHIUM ION SECONDARY BATTERY, POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, AND LITHIUM ION SECONDARY BATTERY 旭化成株式会社 2025-01-23 WO disclosed
US-4978693-A Polyphenylene oxide moldings radiation crosslinked with (meth)acrylated phosphoric acid or admixtures SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1990-12-18 US disclosed
EP-0304936-A2 Heat sensitive paper Kao Corporation (JP) 1989-03-01 EP disclosed
EP-0301523-A2 Molding of modified polyphenylene oxide resin SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1989-02-01 EP disclosed
EP-0280749-A1 A novel resin-coated metallic pigment, a process for its production and its use ASAHI KASEI METALS LIMITED (JP) 1988-09-07 EP disclosed
US-4750940-A ETHYLENICALLY UNSATURATED CARBOXYLIC ACID ESTER AND PHOSPHORIC MONO- OR DI ESTER WITH ETHYLENICALLY DOUBLE BONDS ASAHI KASEI METALS LIMITED (JP) 1988-06-14 US disclosed
JP-S6123652-A PREPARATION OF COATING RESIN DAINIPPON INK & CHEM INC 1986-02-01 JP disclosed