⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11102087 | 0.80 | — | — | |
| SCHEMBL10180633 | 0.78 | — | — | |
| SCHEMBL303126 | 0.77 | — | — | |
| SCHEMBL12919741 | 0.77 | — | — | |
| SCHEMBL12237623 | 0.76 | ATM (0.32) | — | |
| SCHEMBL23974122 | 0.75 | ALDH1A1 (0.33) | — | |
| SCHEMBL10180043 | 0.73 | ATM (0.30) | — | |
| SCHEMBL11108658 | 0.72 | AR (0.31) | — | |
| SCHEMBL1591877 | 0.72 | ATM (0.47) | — | |
| SCHEMBL13793700 | 0.70 | HPGD (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9271401-B2 | Metal film material and method for manufacturing the same | FUJIFILM CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9271401-B2 | Metal film material and method for manufacturing the same | FUJIFILM CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-8734934-B2 | Surface metal film material, method of producing surface metal film material, method of producing metal pattern material, and metal pattern material | FUJIFILM CORPORATION (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8734934-B2 | Surface metal film material, method of producing surface metal film material, method of producing metal pattern material, and metal pattern material | FUJIFILM CORPORATION (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8580481-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130186672-A1 | METAL FILM MATERIAL AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130186672-A1 | METAL FILM MATERIAL AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-25 | — | — | US | disclosed |
| US-8293846-B2 | Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material | FUJIFILM CORPORATION (JP) | 2012-10-23 | — | — | US | disclosed |
| US-8293846-B2 | Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material | FUJIFILM CORPORATION (JP) | 2012-10-23 | — | — | US | disclosed |
| US-8273463-B2 | Multilayer film for plating, method of manufacturing metal film-coated material and metal film-coated material | FUJIFILM CORPORATION (JP) | 2012-09-25 | — | — | US | disclosed |
| US-20090269561-A1 | METHOD OF PRODUCING METAL PLATED MATERIAL, METAL PLATED MATERIAL, METHOD OF PRODUCING METAL PATTERN MATERIAL, AND METAL PATTERN MATERIAL | FUJIFILM CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090269561-A1 | METHOD OF PRODUCING METAL PLATED MATERIAL, METAL PLATED MATERIAL, METHOD OF PRODUCING METAL PATTERN MATERIAL, AND METAL PATTERN MATERIAL | FUJIFILM CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090263743-A1 | RESIST POLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| EP-2105451-A2 | Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate | Fujifilm Corporation (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20090214876-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090214876-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| US-7575846-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20090155553-A1 | Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition | FUJIFILM CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090155553-A1 | Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition | FUJIFILM CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20060127801-A1 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2006-06-15 | — | — | US | disclosed |