SCHEMBL303110

SCHEMBL303110

C=C(C)C(=O)OC1CC2CC1C(C#N)(C#N)C2(C#N)C#N

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MITF O75030 1/20 0.30
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23633727 0.75 ALDH1A1 (0.32) ALDH1A1
SCHEMBL13486938 0.71 RET (0.32) ALDH1A1
SCHEMBL18287609 0.71
SCHEMBL4598002 0.70 CYP19A1 (0.49)
SCHEMBL17213209 0.70 CYP19A1 (0.49)
SCHEMBL14425119 0.68
SCHEMBL4844888 0.68
SCHEMBL3060954 0.67 ALDH1A1 (0.44) ALDH1A1PKM
SCHEMBL14570803 0.67
SCHEMBL809282 0.65 ALDH1A1 (0.46) ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8580481-B2 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2013-11-12 US disclosed
US-20120034561-A1 RESIST POLYMER AND RESIST COMPOSITION MITSUBISHI RAYON CO., LTD. (JP) 2012-02-09 US disclosed
US-8092979-B2 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2012-01-10 US disclosed
US-20090263743-A1 RESIST POLYMER AND RESIST COMPOSITION MITSUBISHI RAYON CO., LTD. (JP) 2009-10-22 US disclosed
US-7575846-B2 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2009-08-18 US disclosed
US-20060127801-A1 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2006-06-15 US disclosed