Aniline

Aniline

SCHEMBL303193

CCC[Si](OCC)(OCC)OCC.Nc1ccccc1

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
TDP1 Q9NUW8 3/20 0.36
CYP3A4 P08684 4/20 0.36
TP53 P04637 1/20 0.36
ALDH1A1 P00352 3/20 0.34
MAOA P21397 5/20 0.33
MAOB P27338 4/20 0.33
CYP1A2 P05177 3/20 0.33
MAPT P10636 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
CYP2C9 P11712 2/20 0.33
CYP2C19 P33261 2/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP2D6 P10635 1/20 0.33
RAB9A P51151 2/20 0.33
NPC1 O15118 1/20 0.33
MAPK1 P28482 1/20 0.33
KDM1A O60341 1/20 0.33
GAA P10253 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Aniline SCHEMBL2116815 0.89 TSHR (0.39) TSHRTDP1CYP3A4TP53ALDH1A1
Aniline SCHEMBL2114370 0.84 TSHR (0.46) TSHRTDP1CYP3A4TP53ALDH1A1
Benzene SCHEMBL28305606 0.83
Aniline SCHEMBL113461 0.82 TSHR (0.44) TSHRTDP1CYP3A4TP53ALDH1A1
Diphenylether SCHEMBL9580825 0.81 LTA4H (0.52) TSHRALDH1A1MAOAMAPTKDM4E
Aniline SCHEMBL10943399 0.81 TSHR (0.42) TSHRTDP1CYP3A4TP53ALDH1A1
Naphthylamine SCHEMBL28651483 0.80 CYP3A4 (0.53) TSHRTDP1CYP3A4TP53ALDH1A1
Diphenylamine SCHEMBL28715243 0.79 HSD17B10 (0.44) TSHRTDP1CYP3A4ALDH1A1MAPT
Anthracene SCHEMBL29043785 0.78 CYP1A2 (0.36) TDP1ALDH1A1CYP1A2MAPTKDM4E
Aniline SCHEMBL17924992 0.78 TSHR (0.48) TSHRTDP1CYP3A4TP53ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 347 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117430812-B Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-03-19 CN claimed
CN-117430812-A Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-01-23 CN claimed
US-11678505-B2 Curable composition comprising hygroscopic particle and display device comprising the same LG DISPLAY CO., LTD. (KR) 2023-06-13 US claimed
CN-114855155-A Aluminum alloy chromium-free treatment liquid and preparation method and application thereof 湖南松井先进表面处理与功能涂层研究院有限公司 2022-08-05 CN claimed
CN-112592439-A Curable composition and display device 乐金显示有限公司 2021-04-02 CN claimed
US-20210098742-A1 CURABLE COMPOSITION AND DISPLAY DEVICE LG DISPLAY CO., LTD. (KR) 2021-04-01 US claimed
US-20140005313-A1 ACRYLIC ACID POLYMER NANOCOMPOSITES FROM AMINOSILANE-MODIFIED COLLOIDAL SILICA E I DU PONT DE NEMOURS AND COMPANY (US) 2014-01-02 US claimed
EP-1932060-B1 NEGATIVE PHOTOSENSITIVE COMPOSITION FOR SILICON KOH ETCH WITHOUT USING SILICON NITRIDE HARDMASK BREWER SCIENCE INC (US) 2013-03-27 EP claimed
WO-2012138364-A1 ACRYLIC ACID POLYMER NANOCOMPOSITES FROM AMINOSILANE-MODIFIED COLLOIDAL SILICA E. I. DU PONT DE NEMOURS AND COMPANY (US) 2012-10-11 WO claimed
US-7709178-B2 Photoresist layer blend of acrylonitrile-styrene copolymer, (bis)phenol novolac epoxy resin, and photoacid generator of triarylsulfonium or diaryliodonium hexafluoroantimonate or hexafluoro-phosphate; silane dissolved inprimer layer; microelectromechanical systems, microelectronics; corrosion resistance BREWER SCIENCE INC. (US) 2010-05-04 US claimed
US-20080261145-A1 Photoresist layer blend of acrylonitrile-styrene copolymer, (bis)phenol novolac epoxy resin, and photoacid generator of triarylsulfonium or diaryliodonium hexafluoroantimonate or hexafluoro-phosphate; silane dissolved inprimer layer; microelectromechanical systems, microelectronics; corrosion resistance NAVY, SECRETARY OF THE UNITED STATES OF AMERICA 2008-10-23 US claimed
EP-1932060-A1 NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE Brewer Science, Inc. (US) 2008-06-18 EP claimed
US-20070075309-A1 NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE BREWER SCIENCE INC. 2007-04-05 US claimed
WO-2007030593-A1 NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE BREWER SCIENCE INC. (US) 2007-03-15 WO claimed
EP-0972303-A1 LOW DIELECTRIC CONSTANT MATERIAL WITH IMPROVED DIELECTRIC STRENGTH W.L. GORE & ASSOCIATES, INC. (US) 2000-01-19 EP claimed
WO-1998044544-A1 LOW DIELECTRIC CONSTANT MATERIAL WITH IMPROVED DIELECTRIC STRENGTH W.L. GORE & ASSOCIATES, INC. (US) 1998-10-08 WO claimed
WO-1998044546-A1 METHOD TO IMPROVE ADHESION OF A THIN SUBMICRON FLUOROPOLYMER FILM ON AN ELECTRONIC DEVICE W.L. GORE & ASSOCIATES, INC. (US) 1998-10-08 WO claimed
WO-1998044545-A1 METHOD TO IMPROVE ADHESION OF A THIN SUBMICRON FLUOROPOLYMER FILM ON AN ELECTRONIC DEVICE W.L. GORE & ASSOCIATES, INC. (US) 1998-10-08 WO claimed
US-4758624-A Silane-crosslinkable halogenated polymer composition and process of crosslinking the same FUJIKURA LTD. (JP) 1988-07-19 US claimed
EP-0171986-A1 Silane-crosslinkable halogenated polymer composition and process of crosslinking the same FUJIKURA LTD. (JP) 1986-02-19 EP claimed