SCHEMBL3036070

SCHEMBL3036070

CCCCS(=O)(=O)NC1CCCCC1

nearest known ligand 0.49

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.48
CA12 O43570 2/20 0.48
CA7 P43166 2/20 0.48
CA14 Q9ULX7 2/20 0.48
PSEN1 P49768 1/20 0.45
PSEN2 P49810 1/20 0.45
APH1B Q8WW43 1/20 0.45
NCSTN Q92542 1/20 0.45
APH1A Q96BI3 1/20 0.45
PSENEN Q9NZ42 1/20 0.45
CA2 P00918 1/20 0.45
HDAC8 Q9BY41 1/20 0.44
CA9 Q16790 1/20 0.44
EPHX1 P07099 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24688471 0.98 PSEN1 (0.46) CA1CA12CA7CA14PSEN1
SCHEMBL27664375 0.93 CA12 (0.45) CA1CA12CA7CA14EPHX1
SCHEMBL4559183 0.93 CA12 (0.45) CA1CA12CA7CA14EPHX1
SCHEMBL22252444 0.92 CA1 (0.43) CA1CA12CA7CA14PSEN1
SCHEMBL21210710 0.91 EPHX1 (0.42) CA1CA12CA7CA14EPHX1
SCHEMBL1678264 0.90 PSEN1 (0.49) CA1CA12CA7CA14PSEN1
SCHEMBL8237882 0.88 CA1 (0.52) CA1CA12CA7CA14PSEN1
SCHEMBL8391325 0.86 CA1 (0.48) CA1CA12CA7CA14PSEN1
SCHEMBL1678500 0.84 PSEN1 (0.44) CA12CA7CA14PSEN1PSEN2
SCHEMBL22363303 0.82 FAAH (0.43) CA12CA7CA14PSEN1PSEN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
CN-114761466-B Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin 富士胶片株式会社 2024-12-10 CN disclosed
CN-115190891-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-10-15 CN disclosed
WO-2024144331-A1 XYLENE DIISOCYANATE COMPOSITION AND METHOD FOR PRODUCING ISOCYANURATE 한화솔루션 주식회사 2024-07-04 WO disclosed
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
EP-3235842-B2 SELF-REPAIRING POLYURETHANE RESIN MATERIAL, SELF-REPAIRING POLYURETHANE RESIN, SELF-REPAIRING COATING MATERIAL, SELF-REPAIRING ELASTOMER MATERIAL, METHOD FOR PRODUCING SELF-REPAIRING POLYURETHANE RESIN MATERIAL, AND METHOD FOR PRODUCING SELF-REPAIRING POLYURETHANE RESIN MITSUI CHEMICALS INC (JP) 2023-10-11 EP disclosed
CN-115768832-A Resin composition, method for producing same, and method for producing composition for pattern formation 富士胶片株式会社 2023-03-07 CN disclosed
CN-115667404-A Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2023-01-31 CN disclosed
CN-115190891-A Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2022-10-14 CN disclosed
EP-2204395-B1 POLYURETHANE RESIN MITSUI CHEMICALS INC (JP) 2013-10-09 EP disclosed
US-20130079486-A1 METHOD FOR PRODUCING 1,5-PENTAMETHYLENEDIAMINE, 1,5-PENTAMETHYLENEDIAMINE, 1,5-PENTAMETHYLENE DIISOCYANATE, METHOD FOR PRODUCING 1,5-PENTAMETHYLENE DIISOCYANATE, POLYISOCYANATE COMPOSITION, AND POLYURETHANE RESIN MITSUI CHEMICALS, INC. (JP) 2013-03-28 US disclosed
EP-2543736-A1 METHOD FOR PRODUCING 1,5-PENTAMETHYLENE DIAMINE, 1,5-PENTAMETHYLENE DIAMINE, 1,5-PENTAMETHYLENE DIISOCYANATE, METHOD FOR PRODUCING 1,5-PENTAMETHYLENE DIISOCYANATE, POLYISOCYANATE COMPOSITION, AND POLYURETHANE RESIN Mitsui Chemicals, Inc. (JP) 2013-01-09 EP disclosed
CN-102782146-A Method for producing 1,5-pentamethylene diamine, 1,5-pentamethylene diamine, 1,5-pentamethylene diisocyanate, method for producing 1,5-pentamethylene diisocyanate, polyisocyanate composition, and polyurethane resin MITSUI CHEMICALS INC 2012-11-14 CN disclosed
US-20100216905-A1 POLYURETHANE RESIN MITSUI CHEMICALS, INC. 2010-08-26 US disclosed
EP-2204395-A1 POLYURETHANE RESIN Mitsui Chemicals, Inc. (JP) 2010-07-07 EP disclosed
EP-0027622-B1 CYCLOALKYL-SULFON AMIDES, PROCESS FOR THEIR PREPARATION, AND THEIR MICROBICIDAL USE BAYER AG (DE) 1983-01-26 EP disclosed
EP-0027622-A1 Cycloalkyl-sulfon amides, process for their preparation, and their microbicidal use BAYER AG (DE) 1981-04-29 EP disclosed
US-4053458-A INHIBITORS UOP INC. (US) 1977-10-11 US disclosed
US-4022828-A BIS-(SULFONAMIDO)-SULFIDES UNIVERSAL OIL PRODUCTS COMPANY (US) 1977-05-10 US disclosed