SCHEMBL30366237

SCHEMBL30366237

Fc1ccc2ccccc2c1F

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.55
HSD17B10 Q99714 4/20 0.55
CYP2A6 P11509 3/20 0.55
TSHR P16473 3/20 0.55
TDP1 Q9NUW8 1/20 0.55
HPRT1 P00492 2/20 0.52
PTPN22 Q9Y2R2 1/20 0.46
HIF1A Q16665 1/20 0.46
CYP1B1 Q16678 1/20 0.46
CYP1A2 P05177 3/20 0.41
PAX8 Q06710 1/20 0.41
NPC1 O15118 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
HPGD P15428 2/20 0.40
MEN1 O00255 1/20 0.40
RAB9A P51151 1/20 0.40
KMT2A Q03164 1/20 0.40
THRB P10828 1/20 0.40
KDM4E B2RXH2 1/20 0.39
MAPT P10636 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29930545 1.00 ALDH1A1 (0.55) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL3836747 1.00 ALDH1A1 (0.55) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL30257704 0.88 HPRT1 (0.64) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL26190035 0.88 HPRT1 (0.64) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL27990175 0.84 HPRT1 (0.40) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL26190016 0.83 HSD17B10 (0.48) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL30584056 0.81 HPRT1 (0.36) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL31589324 0.81 ALDH1A1 (0.58) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL590476 0.80 PTPN22 (0.60) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL6838128 0.78 ALDH1A1 (0.46) ALDH1A1HSD17B10CYP2A6TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed