SCHEMBL30366289

SCHEMBL30366289

Fc1cc(F)c2ccccc2c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 3/20 0.52
CYP1A2 P05177 4/20 0.50
CYP2A6 P11509 3/20 0.50
ALDH1A1 P00352 5/20 0.46
HSD17B10 Q99714 4/20 0.46
HIF1A Q16665 2/20 0.46
CYP1B1 Q16678 1/20 0.46
TSHR P16473 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
TRPM4 Q8TD43 1/20 0.41
MAPK14 Q16539 1/20 0.40
TRPA1 O75762 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
HTR2A P28223 1/20 0.39
NQO2 P16083 1/20 0.39
HPGD P15428 3/20 0.38
KDM4E B2RXH2 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
GLA P06280 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3368401 1.00 HPRT1 (0.52) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL30854669 0.80 CYP1A2 (0.52) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL6935198 0.79 HPRT1 (0.71) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL806448 0.78 CYP1A2 (0.61) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL7834992 0.78 HPRT1 (0.47) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL3110794 0.78 HPRT1 (0.47) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL15352353 0.78 HPRT1 (0.47) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL15352078 0.78 HPRT1 (0.47) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL21554160 0.78 HPRT1 (0.47) HPRT1CYP1A2CYP2A6ALDH1A1HSD17B10
SCHEMBL15352082 0.78 NQO2 (0.61) HPRT1CYP1A2ALDH1A1HSD17B10HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed