SCHEMBL30366405

SCHEMBL30366405

Fc1ccc2cc(F)ccc2c1

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.77
CYP2A6 P11509 1/20 0.77
BACE1 P56817 1/20 0.50
AHR P35869 2/20 0.48
L3MBTL1 Q9Y468 1/20 0.43
ALDH1A1 P00352 2/20 0.43
CA3 P07451 1/20 0.43
CA6 P23280 1/20 0.43
CA5A P35218 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43
CA5B Q9Y2D0 1/20 0.43
SLC6A4 P31645 4/20 0.42
SLC6A3 Q01959 4/20 0.42
SLC6A2 P23975 1/20 0.39
KCNH2 Q12809 1/20 0.39
CASP3 P42574 1/20 0.39
SENP8 Q96LD8 1/20 0.39
SENP7 Q9BQF6 1/20 0.39
SENP6 Q9GZR1 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562601 1.00 CYP1A2 (0.77) CYP1A2CYP2A6BACE1AHRL3MBTL1
SCHEMBL11303205 0.93 CYP1A2 (0.68) CYP1A2CYP2A6BACE1AHRL3MBTL1
SCHEMBL3828830 0.93 CYP1A2 (0.68) CYP1A2CYP2A6BACE1AHRL3MBTL1
SCHEMBL29936739 0.89 CYP1A2 (0.72) CYP1A2CYP2A6BACE1AHRL3MBTL1
SCHEMBL6564751 0.89 CYP1A2 (0.72) CYP1A2CYP2A6BACE1AHRL3MBTL1
SCHEMBL18087081 0.87 CYP2A6 (1.00) CYP1A2CYP2A6BACE1L3MBTL1ALDH1A1
SCHEMBL8563678 0.87 CYP1A2 (0.62) CYP1A2CYP2A6BACE1AHRL3MBTL1
SCHEMBL29937325 0.87 CYP2A6 (1.00) CYP1A2CYP2A6BACE1L3MBTL1ALDH1A1
SCHEMBL29420986 0.87 CYP2A6 (1.00) CYP1A2CYP2A6BACE1L3MBTL1ALDH1A1
SCHEMBL935337 0.87 CYP2A6 (1.00) CYP1A2CYP2A6BACE1L3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed