SCHEMBL30366567

SCHEMBL30366567

Clc1ccc2cccc(Cl)c2c1

nearest known ligand 0.58

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 5/20 0.58
CYP1A2 P05177 2/20 0.58
NR4A2 P43354 2/20 0.42
TRPV1 Q8NER1 2/20 0.41
ADRA2A P08913 1/20 0.41
CHEK1 O14757 1/20 0.40
FADS1 O60427 1/20 0.40
TP53 P04637 1/20 0.40
AHR P35869 2/20 0.38
TSHR P16473 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
CYP3A4 P08684 1/20 0.38
MAPK1 P28482 1/20 0.38
ALDH1A1 P00352 1/20 0.38
HSD17B10 Q99714 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6561452 1.00 CYP2A6 (0.58) CYP2A6CYP1A2NR4A2TRPV1ADRA2A
Propane SCHEMBL28860823 0.92 CYP2A6 (0.50) CYP2A6CYP1A2NR4A2TRPV1ADRA2A
SCHEMBL145859 0.83 CYP2A6 (0.68) CYP2A6CYP1A2FADS1TSHRTDP1
SCHEMBL8208536 0.83 CYP2A6 (0.68) CYP2A6CYP1A2FADS1TSHRTDP1
SCHEMBL30366566 0.81 CYP1A2 (0.58) CYP2A6CYP1A2NR4A2FADS1TP53
SCHEMBL30366437 0.81 CYP1A2 (0.58) CYP2A6CYP1A2NR4A2FADS1TP53
SCHEMBL1780245 0.81 CYP1A2 (0.58) CYP2A6CYP1A2NR4A2FADS1TP53
SCHEMBL29972350 0.79 CYP2A6 (0.62) CYP2A6CYP1A2NR4A2ADRA2ACHEK1
SCHEMBL5668937 0.79 CYP2A6 (0.62) CYP2A6CYP1A2NR4A2ADRA2ACHEK1
SCHEMBL5411000 0.79 CYP2A6 (0.52) CYP2A6NR4A2CHEK1TP53AHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed