SCHEMBL30381676

SCHEMBL30381676

Bc1ccc(-c2c3nc(c(-c4ccc(B)cc4)c4ccc([nH]4)c(-c4ccc(B)cc4)c4nc(c(-c5ccc(B)cc5)c5ccc2[nH]5)C=C4)C=C3)cc1

nearest known ligand 0.60

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ TOP1 P11387 4/20 0.60
▸ CYCS P99999 3/20 0.58
▸ TERT O14746 4/20 0.57
▸ ENPP2 Q13822 1/20 0.57
▸ ABCG2 Q9UNQ0 1/20 0.49
▸ STAT3 P40763 1/20 0.44
▸ STAT1 P42224 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29693624 0.81 TERT (0.62) TOP1CYCSTERTENPP2ABCG2
SCHEMBL30092778 0.81 TOP1 (0.60) TOP1CYCSTERTENPP2ABCG2
SCHEMBL30092775 0.81 TOP1 (0.60) TOP1CYCSTERTENPP2ABCG2
SCHEMBL580722 0.81 TOP1 (0.60) TOP1CYCSTERTENPP2ABCG2
SCHEMBL10592809 0.81 TOP1 (0.60) TOP1CYCSTERTENPP2ABCG2
SCHEMBL24677625 0.81 TOP1 (0.60) TOP1CYCSTERTENPP2ABCG2
SCHEMBL242168 0.81 TERT (0.62) TOP1CYCSTERTENPP2ABCG2
SCHEMBL3041824 0.81 TOP1 (0.60) TOP1CYCSTERTENPP2ABCG2
SCHEMBL3424111 0.81 TOP1 (0.81) TOP1CYCSTERTENPP2ABCG2
SCHEMBL499290 0.81 TOP1 (0.65) TOP1CYCSTERTENPP2ABCG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115487866-B Covalent organic framework material coupling nano metal catalyst and preparation method thereof 浙江大学 2024-05-14 — — CN claimed
CN-115487866-B Covalent organic framework material coupling nano metal catalyst and preparation method thereof 浙江大学 2024-05-14 — — CN disclosed
CN-112654599-B Preparation method of covalent organic framework material and defect repair method 浙江大学 2023-04-28 — — CN disclosed
Send feedback