SCHEMBL30453326

SCHEMBL30453326

Oc1ccc(CC(c2ccc(O)cc2)C(Cc2ccc(O)cc2)c2ccc(O)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 15/20 0.61
ESR2 Q92731 14/20 0.61
CYP1A2 P05177 2/20 0.56
CYP3A4 P08684 2/20 0.56
CYP2C9 P11712 2/20 0.56
CYP2C19 P33261 2/20 0.56
SLC6A2 P23975 2/20 0.56
LMNA P02545 1/20 0.56
PGR P06401 1/20 0.56
CHRM2 P08172 1/20 0.56
ADORA3 P0DMS8 1/20 0.56
AR P10275 1/20 0.56
CYP2D6 P10635 1/20 0.56
MAPT P10636 1/20 0.56
CHRM1 P11229 1/20 0.56
ALOX15 P16050 1/20 0.56
DRD1 P21728 1/20 0.56
TBXA2R P21731 1/20 0.56
PTGS1 P23219 1/20 0.56
ADRA1A P35348 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4241472 0.89 ESR1 (0.55) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL285683 0.87 ESR1 (0.64) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL24186779 0.82 ESR1 (0.59) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL10774365 0.82 ESR1 (0.48) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL21959544 0.80 ESR1 (0.61) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL18382530 0.80 ESR1 (0.56) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL5818107 0.80 ESR1 (0.61) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL6744903 0.80 ESR1 (0.76) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL231792 0.80 ESR1 (0.61) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL16093258 0.78 ESR1 (0.64) ESR1ESR2CYP1A2CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116430671-A Photoresist composition and photoetching process 上海飞凯材料科技股份有限公司 2023-07-14 CN claimed
CN-116430671-A Photoresist composition and photoetching process 上海飞凯材料科技股份有限公司 2023-07-14 CN disclosed