2-Ethylhexanoic Acid

2-Ethylhexanoic Acid

SCHEMBL305226

CCCCC(CC)C(=O)[O-].CCCCC(CC)C(=O)[O-].CCCCC(CC)C(=O)[O-].CCCCC(CC)C(=O)[O-].CCCCC(CC)C(=O)[O-].[Ta+5]

nearest known ligand 0.91

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 10/20 0.91
MAPK1 P28482 1/20 0.61
CA1 P00915 7/20 0.59
CYP3A4 P08684 2/20 0.56
TSHR P16473 2/20 0.56
NFKB1 P19838 2/20 0.56
NPSR1 Q6W5P4 2/20 0.56
SLC1A3 P43003 1/20 0.42
SLC1A2 P43004 1/20 0.42
SLC1A1 P43005 1/20 0.42
USP2 O75604 1/20 0.41
CA7 P43166 1/20 0.41
CA14 Q9ULX7 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
2-Ethylhexanoic Acid SCHEMBL1506922 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL8577270 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL714268 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL6130019 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL1962834 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL23802667 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL546693 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL20582677 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL21569275 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL7174090 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2491164-B1 SURFACE PASSIVATION TECHNIQUE FOR REDUCTION OF FOULING NALCO CO (US) 2019-11-06 EP claimed
EP-2491164-A2 SURFACE PASSIVATION TECHNIQUE FOR REDUCTION OF FOULING Nalco Company (US) 2012-08-29 EP claimed
US-8092618-B2 Surface passivation technique for reduction of fouling NALCO COMPANY (US) 2012-01-10 US claimed
WO-2011049724-A2 SURFACE PASSIVATION TECHNIQUE FOR REDUCTION OF FOULING NALCO COMPANY (US) 2011-04-28 WO claimed
US-20110088729-A1 SURFACE PASSIVATION TECHNIQUE FOR REDUCTION OF FOULING NALCO COMPANY 2011-04-21 US claimed
EP-1218928-A1 INTEGRATED CIRCUITS WITH BARRIER LAYERS AND METHODS OF FABRICATING SAME SYMETRIX CORPORATION (US) 2002-07-03 EP claimed
WO-2001024237-A1 INTEGRATED CIRCUITS WITH BARRIER LAYERS AND METHODS OF FABRICATING SAME SYMETRIX CORPORATION (US) 2001-04-05 WO claimed
JP-11079895-A None JP disclosed
CN-118302563-A Electrode catalyst and water electrolytic cell 国立大学法人山梨大学 2024-07-05 CN disclosed
CN-116670866-A Tin oxide microcrystal beads or tin oxide and titanium oxide composite oxide microcrystal beads 日本化学产业株式会社 2023-08-29 CN disclosed
CN-112714671-B Supported metal catalyst and method for producing the same 日本化学产业株式会社 2023-08-15 CN disclosed
CN-116018204-A Supported metal catalyst 国立大学法人山梨大学 2023-04-25 CN disclosed
CN-114650878-A Supported metal catalyst and electrochemical cell 国立大学法人山梨大学 2022-06-21 CN disclosed
WO-1996029728-A1 INTEGRATED CIRCUITS HAVING MIXED LAYERED SUPERLATTICE MATERIALS AND PRECURSOR SOLUTIONS FOR USE IN A PROCESS OF MAKING THE SAME MATSUSHITA ELECTRONICS CORPORATION (JP) 1996-09-26 WO disclosed
US-5516363-A Specially doped precursor solutions for use in methods of producing doped ABO3 -type average perovskite thin-film capacitors SYMETRIX CORPORATION (US) 1996-05-14 US disclosed
US-5508226-A Low temperature process for fabricating layered superlattice materialsand making electronic devices including same SYMETRIX CORPORATION (US) 1996-04-16 US disclosed
EP-0665981-A1 PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS AND MAKING ELECTRONIC DEVICES INCLUDING SAME SYMETRIX CORPORATION (US) 1995-08-09 EP disclosed
US-5439845-A Process for fabricating layered superlattice materials and making electronic devices including same OLYMPUS OPTICAL CO., LTD. (JP) 1995-08-08 US disclosed
US-5434102-A Integrated circuits SYMETRIX CORPORATION (US) 1995-07-18 US disclosed
WO-1994010702-A1 PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS AND MAKING ELECTRONIC DEVICES INCLUDING SAME SYMETRIX CORPORATION (US) 1994-05-11 WO disclosed