Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 2/20 | 0.51 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.45 |
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | TOP1 | P11387 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | ARG2 | P78540 | 1/20 | 0.39 |
| ▸ | ALPI | P09923 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30530 | 1.00 | CYP2C9 (0.51) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| Iodide SCHEMBL3761279 | 0.98 | CYP2C9 (0.50) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| SCHEMBL6736205 | 0.94 | CYP2C9 (0.47) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| SCHEMBL6736212 | 0.94 | CYP2C9 (0.47) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| Biphenyl SCHEMBL28243732 | 0.94 | CYP2C9 (0.47) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| Methacrylic Acid SCHEMBL3739483 | 0.93 | CYP2C9 (0.46) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| Methacrylic Acid SCHEMBL1082310 | 0.93 | CYP2C9 (0.46) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| SCHEMBL19097596 | 0.93 | LMNA (0.55) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| Methacrylic Acid SCHEMBL1082313 | 0.93 | CYP2C9 (0.46) | CYP2C9AKR1C3ALDH1A1MAOBLMNA | |
| SCHEMBL19097595 | 0.93 | LMNA (0.55) | CYP2C9AKR1C3ALDH1A1MAOBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4558 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4534627-B1 | QUANTUM DOT COMPOSITION, METHOD OF MANUFACTURING THE SAME, CURED PRODUCT THEREOF, AND DISPLAY DEVICE INCLUDING THE SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-20 | — | — | EP | claimed |
| US-20260132302-A1 | INKJET INK | KYOCERA DOCUMENT SOLUTIONS INC (JP) | 2026-05-14 | — | — | US | claimed |
| US-20260103623-A1 | TWO-PART, CYANOACRYLATE/FREE RADICALLY CURABLE ADHESIVE SYSTEMS | HENKEL AG & CO KGAA (DE) | 2026-04-16 | — | — | US | claimed |
| EP-4724508-A1 | COATING COLOR COMPOSITION | Coatex (FR) | 2026-04-15 | — | — | EP | claimed |
| US-20260098164-A1 | INKJET INK | KYOCERA DOCUMENT SOLUTIONS INC (JP) | 2026-04-09 | — | — | US | claimed |
| EP-4476297-B1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION WITH IMPROVED CHEMICAL RESISTANCE | TESA SE (DE) | 2026-04-01 | — | — | EP | claimed |
| EP-4717740-A1 | INKJET INK | KYOCERA Document Solutions Inc. (JP) | 2026-04-01 | — | — | EP | claimed |
| US-20260085202-A1 | INKJET INK | KYOCERA DOCUMENT SOLUTIONS INC (JP) | 2026-03-26 | — | — | US | claimed |
| EP-3423506-B1 | STYRENE-FREE REACTIVE DILUENTS FOR URETHANE ACRYLATE RESIN COMPOSITIONS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2026-03-25 | — | — | EP | claimed |
| EP-3642276-B1 | POLYVINYL CHLORIDE COMPOSITIONS CONTAINING IMPACT MODIFIERS AND CALCIUM CARBONATE | DOW GLOBAL TECHNOLOGIES LLC (US) | 2026-03-25 | — | — | EP | claimed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| EP-0079057-B1 | PRESENSITIZED LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1985-09-11 | — | — | EP | claimed |
| EP-0082204-B1 | PLASTIC LENS WITH HIGH REFRACTIVE INDEX | HOYA LENS CORPORATION (JP) | 1985-08-21 | — | — | EP | claimed |
| EP-0115066-A2 | Moulding Material based on acrylic resins with slight water absorption | Röhm GmbH (DE) | 1984-08-08 | — | — | EP | claimed |
| US-4405707-A | Method of producing relief structures for integrated semiconductor circuits | SIEMENS AKTIENGESELLSCHAFT (DE) | 1983-09-20 | — | — | US | claimed |
| EP-0082204-A1 | PLASTIC LENS WITH HIGH REFRACTIVE INDEX | HOYA LENS CORPORATION (JP) | 1983-06-29 | — | — | EP | claimed |
| US-4388399-A | ALCOHOL-SOLUBLE POLYAMIDE BLEND WITH OTHER POLYMER UNDER PHOTORESIST LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 1983-06-14 | — | — | US | claimed |
| EP-0006938-B1 | POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS | FUJITSU LIMITED (JP) | 1982-08-04 | — | — | EP | claimed |
| EP-0006939-B1 | POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS | FUJITSU LIMITED (JP) | 1982-07-28 | — | — | EP | claimed |
| US-4306780-A | Highly refractive copolymer of an ethylinically unsaturated alkylene oxide of bis-phenol-A and an ethylinically unsaturated aromatic compound for lens and a lens prepared therefrom | HOYA LENS CORPORATION (JP) | 1981-12-22 | — | — | US | claimed |